G03F 7/0752
In non photosensitive layers or as additives
Official title: {in non photosensitive layers or as additives, e.g. for dry lithography}
G03F7/0752 (In non photosensitive layers or as additives) appears on 499 US grants and 628 published applications in this corpus.
Search patents in G03F- Granted patents
- 499
- Published applications
- 628
- Assignees
- 125
- Inventors
- 1,085
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 3 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 4 | 0 |
| 1989 | 7 | 0 |
| 1990 | 2 | 0 |
| 1991 | 5 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 6 | 0 |
| 2000 | 7 | 0 |
| 2001 | 6 | 0 |
| 2002 | 2 | 6 |
| 2003 | 2 | 1 |
| 2004 | 4 | 6 |
| 2005 | 5 | 11 |
| 2006 | 5 | 6 |
| 2007 | 2 | 22 |
| 2008 | 8 | 19 |
| 2009 | 11 | 13 |
| 2010 | 13 | 28 |
| 2011 | 18 | 21 |
| 2012 | 13 | 16 |
| 2013 | 12 | 29 |
| 2014 | 21 | 35 |
| 2015 | 44 | 44 |
| 2016 | 36 | 34 |
| 2017 | 26 | 34 |
| 2018 | 31 | 30 |
| 2019 | 25 | 35 |
| 2020 | 26 | 37 |
| 2021 | 19 | 28 |
| 2022 | 23 | 34 |
| 2023 | 21 | 30 |
| 2024 | 21 | 46 |
| 2025 | 18 | 37 |
| 2026 | 19 | 26 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Alkaline developer soluable silicon-containing resist underlayer film-forming composition25 Aug 2026US 12,717,235 B2Nissan Chemical Corporation
- Generation of multiline etch substrates25 Aug 2026US 12,721,060 B2Geminatio, Inc.
- Film forming composition16 Jun 2026US 12,656,685 B2Nissan Chemical Corporation
- Resist underlayer film-forming composition, resist underlayer film, and method of producing semiconductor substrate16 Jun 2026US 12,656,686 B2Jsr Corporation
- Photoresist composition, a method for manufacturing a photoresist coating, etched photoresist coating, and etched Si containing layer(s), and manufacturing a device using thereof2 Jun 2026US 12,645,142 B2Merck Patent GmbH
- Additives for organotin photoresist compositions and patterning of the same1 Oct 2026US 2026/0299407 A1
- Resist underlayer film-forming composition for producing optical diffractive body10 Sep 2026US 2026/0267223 A1Nissan Chemical Corporation
- Dry resist system and method of using10 Sep 2026US 2026/0267231 A1Tokyo Electron Limited
- Silicon-containing resist underlayer film-forming composition having carbon-carbon double bond20 Aug 2026US 2026/0244104 A1Nissan Chemical Corporation
- Silicon-containing resist underlayer film-forming composition20 Aug 2026US 2026/0244105 A1Nissan Chemical Corporation
Most cited
By later US patents
- Radiation patternable CVD film460US 8,465,903 B2APPLIED Materials.Inc. · 2013
- Atomic layer deposition of photoresist materials and hard mask precursors382US 8,536,068 B2APPLIED Materials.Inc. · 2013
- Radiation-sensitive recording material for the production of driographic offset printing plates328US 6,274,285 B1Agfa-Gevaert · 2001
- Silicon containing TARC/barrier layer35US 7,320,855 B2International Business Machines Corporation · 2008
- Pre-sensitized lithoprinting plate requiring no fountain solution34US 3,953,212 AFuji Photo Film Co., Ltd. · 1976