Dry resist system and method of using
AssigneeTokyo Electron Limited
InventorKandabara Tapily
Life of this patent
Estimating the term…
Abstract
A method of operating a manufacturing platform includes moving a substrate through the manufacturing platform using one or more transfer modules. A dry resist is deposited on the substrate using a resist deposition module of the manufacturing platform. The substrate is examined for distortion with a metrology system that is part of a transfer module. The dry resist is exposed to UV or EUV radiation using an exposure tool of the manufacturing platform. Exposed or unexposed portions of the dry resist are removed using an etch module of the manufacturing platform.
Claims20
A manufacturing platform, comprising:
- a transfer tool configured for moving a substrate through the manufacturing platform, the transfer tool comprising:
- a metrology system configured to measure distortion of the substrate, and one or more actuators configured to correct bow distortion of the substrate;
- a resist deposition tool coupled with the transfer tool, the resist deposition tool being configured for depositing a dry resist on the substrate;
- an exposure tool coupled with the transfer tool, the exposure tool being configured for exposing the dry resist to UV or EUV radiation;
- and
- an etch tool coupled with the transfer tool, the etch tool being configured for removal of exposed or unexposed portions of the dry resist by a dry etch process to form a mask on the substrate.
A manufacturing platform, comprising:
- a transfer tool configured for moving a substrate through the manufacturing platform, the transfer tool comprising:
- a metrology system configured to measure distortion of the substrate, and one or more actuators configured to correct bow distortion of the substrate;
- a mini-batch tool coupled with the transfer tool, the mini-batch tool being configured for simultaneously processing multiple substrates;
- a resist deposition tool coupled with the transfer tool, the resist deposition tool being configured for depositing a dry resist on the substrate;
- and
- an exposure tool coupled with the transfer tool, the exposure tool being configured for exposing the dry resist to UV or EUV radiation.
A manufacturing platform, comprising:
- an exposure tool configured for exposing a dry resist on a substrate to EUV radiation;
- a first transfer tool coupled with the exposure tool;
- a developer/bake tool between exposure tool and the first transfer tool;
- a second transfer tool coupled with the first transfer tool;
- a deposition tool coupled with the second transfer tool, the deposition tool being configured for depositing a film on a substrate;
- and
- an etch tool coupled with the second transfer tool, the etch tool being configured for removal of exposed or unexposed portions of the dry resist over the film by a dry etch process.
Dependencies are inferred from the claim text.