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US 12,656,685 B2Granted
Film forming composition
AssigneeNissan Chemical Corporation
InventorsWataru Shibayama, Yutaro Kuramoto, Satoshi Takeda, Shuhei Shigaki, Ken Ishibashi, Makoto Nakajima
Life of this patent
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Abstract
A film-forming composition is suitable as a resist underlayer film-forming composition capable of forming an Si-containing resist underlayer film that exhibits favorable adhesion to an EUV resist and favorable etching processability because of high rate of etching with fluorine. A film-forming composition, for example, including a polymer of Formula (E1) and a solvent.
Claims11
A film-forming composition comprising
- (a) at least one selected from a hydrolyzable silane, a hydrolysate of the hydrolyzable silane, and a hydrolysis condensate of the hydrolyzable silane, wherein:
- the hydrolyzable silane contains a hetero-ring-containing silane of the following Formula (1):
- R1R2aSi(R3)3-a (1)
- wherein
- R1 is an organic group containing a furan ring and/or a thiophene ring, wherein the organic group containing a furan ring and/or a thiophene ring is an organic group of the following Formula (K):
- wherein
- nL is an integer of 0 to 10;
- nA is an integer of 0 to 5;
- RY is each independently a hydrogen atom, a methyl group, an ethyl group, a nitro group, a cyano group, a hydroxy group, a thiol group, a furan-ring-containing group, or a thiophene-ring-containing group, and (nL×2) RYs are optionally identical to or different from one another;
- RE is a hydrogen atom, a methyl group, an ethyl group, a nitro group, a cyano group, a hydroxy group, a thiol group, a furan-ring-containing group, or a thiophene-ring-containing group;
- LA is each independently a divalent group of any of the following Formulae (L1), (L2), (L3), (L4), (L5), (L6a), (L6b), (L7), (L8), (L9a), (L9b), and (L10):
- wherein RL is each independently a hydrogen atom, an alkyl group, or an aryl group;
- when nL is 0, nA is 0, and RE is a furan-ring-containing group or a thiophene-ring-containing group;
- when nL is 1 or more, at least one of (nL×2) RYs and RE is a furan-ring-containing group or a thiophene-ring-containing group;
- and when a plurality of -LA-groups are present, the -LA- groups are not bonded together;
- and
- wherein the thiophene-ring-containing group is selected from the group consisting of
- wherein each RS is independently a single bond, a hydrogen atom, any atom other than a hydrogen atom, or any substituent, with the provisos that (a) one RS in each Formula is a single bond and is bonded to the silicon atom in Formula (1) directly or via a spacer group, (b) each of the RS in Formula (T1) are not hydrogen atom simultaneously, and (c) if the composition comprises a hydrolysis condensate of the hydrolyzable silane, the hydrolysis condensate can include a hydrolysis condensate of Formula (E7):
- R2 is a group bonded to a silicon atom, and is each independently an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted aralkyl group, an optionally substituted halogenated alkyl group, an optionally substituted halogenated aryl group, an optionally substituted halogenated aralkyl group, an optionally substituted alkoxyalkyl group, an optionally substituted alkoxyaryl group, an optionally substituted alkoxyaralkyl group, or an optionally substituted alkenyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, or a cyano group;
- R3 is a group or atom bonded to a silicon atom, and is each independently an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom;
- the organic group containing a furan ring and/or a thiophene ring of R1 and the alkoxy group, aralkyloxy group, or acyloxy group of R3 are optionally bonded together to form a ring;
- and
- a is an integer of 0 to 2,
- (b) at least one additional silane selected from the group consisting of the following Formula (2) and the following Formula (3):
- Si(R12)4-b (2)
- [R21cSi(R22)3-c]2Y (3)
- wherein in Formula (2), R12 is a group or atom bonded to a silicon atom, and is each independently an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom;
- and
- b is 0;
- and
- wherein in Formula (3), R21 is a group bonded to a silicon atom, and is each independently an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted aralkyl group, an optionally substituted halogenated alkyl group, an optionally substituted halogenated aryl group, an optionally substituted halogenated aralkyl group, an optionally substituted alkoxyalkyl group, an optionally substituted alkoxyaryl group, an optionally substituted alkoxyaralkyl group, or an optionally substituted alkenyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, or a cyano group;
- R22 is a group or atom bonded to a silicon atom, and is each independently an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom;
- Y is a group bonded to a silicon atom, and is each independently an alkylene group or an arylene group;
- and
- c is each independently an integer of 0 to 2,
- (c) a solvent, and
- (d) an additive selected from the group consisting of triphenylsulfonium nitrate, triphenylsulfonium trifluoroacetate, triphenylsulfonium hydrochloride, triphenylsulfonium acetate, and combinations thereof.
34 more elements
Dependencies are inferred from the claim text.