Resist underlayer film-forming composition for producing optical diffractive body
AssigneeNissan Chemical Corporation
InventorsTakahiro KISHIOKA, Rikimaru SAKAMOTO, Satoshi KAMIBAYASHI, Shunsuke MORIYA
Life of this patent
Estimating the term…
Abstract
A laminate for producing an optical diffractive body having a substrate and an optical diffraction grating layer disposed on the substrate and having a plurality of grooves using a photolithography or electron beam lithography technique, the laminate comprising: the substrate; a precursor layer that becomes the optical diffraction grating layer by being disposed on the substrate and forming the plurality of grooves therein; and an antireflection organic resin layer disposed on the precursor layer.
Claims20
A laminate for producing an optical diffractive body having a substrate and an optical diffraction grating layer disposed on the substrate and having a plurality of grooves using a photolithography or electron beam lithography technique, the laminate comprising:
- the substrate;
- a precursor layer that becomes the optical diffraction grating layer by being disposed on the substrate and forming the plurality of grooves therein;
- and
- an antireflection organic resin layer disposed on the precursor layer.
A laminate for producing an optical diffractive body having a substrate and an optical diffraction grating layer disposed on the substrate and having a plurality of grooves using a photolithography or electron beam lithography technique, the laminate comprising:
- the substrate;
- a precursor layer that becomes the optical diffraction grating layer by being disposed on the substrate and forming the plurality of grooves therein;
- an inorganic mask layer disposed on the precursor layer;
- and
- an antireflection organic resin layer disposed on the inorganic mask layer.
A laminate for producing an optical diffractive body having a substrate and an optical diffraction grating layer disposed on the substrate and having a plurality of grooves using a photolithography or electron beam lithography technique, the laminate comprising:
- the substrate;
- a precursor layer that becomes the optical diffraction grating layer by being disposed on the substrate and forming the plurality of grooves therein;
- an organic resin layer disposed on the precursor layer;
- and
- a silicon-containing resin layer disposed on the organic resin layer.
A laminate for producing an optical diffractive body having a substrate and an optical diffraction grating layer disposed on the substrate and having a plurality of grooves using a photolithography or electron beam lithography technique, the laminate comprising:
- the substrate;
- a precursor layer that becomes the optical diffraction grating layer by being disposed on the substrate and forming the plurality of grooves therein;
- an organic resin layer disposed on the precursor layer;
- and
- an inorganic material layer disposed on the organic resin layer.
Dependencies are inferred from the claim text.