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US 12,748,350 B2Granted
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHitoshi Maruyama, Kumiko Hayashi
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Abstract
Provided is a photosensitive resin composition containing: (A) a silicone resin containing an acid-crosslinkable group; (B) an alicyclic epoxy compound represented by formula (B1) or (B2); and (C) a photo-acid-generating agent. (In the formula, R11 through R46 are each independently a hydrogen atom or a C1-8 saturated hydrocarbyl group.)
Claims14
A photosensitive resin composition comprising
- (A) a silicone resin containing an acid crosslinkable group,
- (B) an alicyclic epoxy compound having the formula (B1) or (B2):
- wherein R11 to R46 are each independently a hydrogen atom or a C1-C8 saturated hydrocarbyl group, and
- (C) a photoacid generator.
1 more element
Dependencies are inferred from the claim text.