H01J 37/32009
Arrangements for generation of plasma specially adapted for examination or treatment of
Official title: {Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24)}
H01J37/32009 (Arrangements for generation of plasma specially adapted for examination or treatment of) appears on 11,647 US grants and 14,288 published applications in this corpus.
Search patents in H01J- Granted patents
- 11,647
- Published applications
- 14,288
- Assignees
- 2,111
- Inventors
- 17,479
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 3 | 0 |
| 1978 | 8 | 0 |
| 1979 | 6 | 0 |
| 1980 | 8 | 0 |
| 1981 | 13 | 0 |
| 1982 | 17 | 0 |
| 1983 | 15 | 0 |
| 1984 | 24 | 0 |
| 1985 | 31 | 0 |
| 1986 | 32 | 0 |
| 1987 | 24 | 0 |
| 1988 | 27 | 0 |
| 1989 | 44 | 0 |
| 1990 | 59 | 0 |
| 1991 | 55 | 0 |
| 1992 | 62 | 0 |
| 1993 | 91 | 0 |
| 1994 | 107 | 0 |
| 1995 | 116 | 0 |
| 1996 | 113 | 0 |
| 1997 | 126 | 0 |
| 1998 | 146 | 0 |
| 1999 | 194 | 0 |
| 2000 | 262 | 0 |
| 2001 | 297 | 129 |
| 2002 | 316 | 302 |
| 2003 | 248 | 346 |
| 2004 | 257 | 431 |
| 2005 | 198 | 372 |
| 2006 | 186 | 374 |
| 2007 | 161 | 438 |
| 2008 | 160 | 401 |
| 2009 | 188 | 444 |
| 2010 | 256 | 457 |
| 2011 | 242 | 418 |
| 2012 | 290 | 405 |
| 2013 | 299 | 453 |
| 2014 | 353 | 573 |
| 2015 | 416 | 718 |
| 2016 | 550 | 703 |
| 2017 | 505 | 712 |
| 2018 | 519 | 644 |
| 2019 | 624 | 688 |
| 2020 | 634 | 774 |
| 2021 | 538 | 734 |
| 2022 | 555 | 803 |
| 2023 | 497 | 861 |
| 2024 | 635 | 785 |
| 2025 | 660 | 777 |
| 2026 | 476 | 546 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/32082Radio frequency generated discharge7,273
- H01J 37/32192Microwave generated discharge1,653
- H01J 37/32357Generation remote from the workpiece1,398
- H01J 37/32422Arrangement for selecting ions or species in the plasma617
- H01J 37/32055Arc discharge436
- H01J 37/32018Glow discharge433
- H01J 37/32412Plasma immersion ion implantation327
- H01J 37/32366Localised processing301
Recent patents
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,932 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,933 B2Trumpf Huettinger Sp. Z O. O.
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- Process control for ion energy delivery using multiple generators and phase control6 Oct 2026US 12,755,935 B2Lam Research Corporation
- Apparatus and Method of Generating a Waveform8 Oct 2026US 2026/0311965 A1Eagle Harbor Technologies, Inc.
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Plasma processing apparatus, power source system, and plasma processing method8 Oct 2026US 2026/0311967 A1Tokyo Electron Limited
- Rf impedance matching network8 Oct 2026US 2026/0311968 A1ASM America, Inc.
- Showerhead structure, and substrate processing chamber and semiconductor processing apparatus having the same8 Oct 2026US 2026/0311970 A1ASM IP Holding B. V.
Most cited
By later US patents
- Integration of remote plasma generator with semiconductor processing chamber865US 6,387,207 B1APPLIED Materials.Inc. · 2002
- Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process777US 5,000,113 AAPPLIED Materials.Inc. · 1991
- Plasma uniformity control by gas diffuser hole design746US 8,083,853 B2APPLIED Materials.Inc. · 2011
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992
- Apparatus for treating the surface with neutral particle beams715US 6,935,269 B2Hag-Joo Lee · 2005