H01J 37/32055
Arc discharge
Official title: {Arc discharge}
H01J37/32055 (Arc discharge) appears on 436 US grants and 410 published applications in this corpus.
Search patents in H01J- Granted patents
- 436
- Published applications
- 410
- Assignees
- 253
- Inventors
- 977
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 7 | 0 |
| 1985 | 5 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 4 | 0 |
| 1989 | 1 | 0 |
| 1990 | 6 | 0 |
| 1991 | 0 | 0 |
| 1992 | 7 | 0 |
| 1993 | 6 | 0 |
| 1994 | 10 | 0 |
| 1995 | 12 | 0 |
| 1996 | 6 | 0 |
| 1997 | 6 | 0 |
| 1998 | 12 | 0 |
| 1999 | 13 | 0 |
| 2000 | 9 | 0 |
| 2001 | 7 | 6 |
| 2002 | 12 | 12 |
| 2003 | 13 | 12 |
| 2004 | 13 | 21 |
| 2005 | 11 | 8 |
| 2006 | 9 | 5 |
| 2007 | 5 | 16 |
| 2008 | 2 | 17 |
| 2009 | 4 | 9 |
| 2010 | 5 | 26 |
| 2011 | 5 | 13 |
| 2012 | 9 | 8 |
| 2013 | 3 | 17 |
| 2014 | 8 | 25 |
| 2015 | 18 | 29 |
| 2016 | 22 | 31 |
| 2017 | 24 | 21 |
| 2018 | 19 | 14 |
| 2019 | 23 | 14 |
| 2020 | 24 | 21 |
| 2021 | 14 | 16 |
| 2022 | 20 | 14 |
| 2023 | 10 | 15 |
| 2024 | 15 | 19 |
| 2025 | 15 | 13 |
| 2026 | 9 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Arc current reduction from an electrostatic chuck6 Oct 2026US 12,757,680 B2APPLIED Materials.Inc.
- Target processing device and target processing method7 Jul 2026US 12,676,292 B2Kioxia Corporation
- Arc-beam scanning for suppressing anode overgrowth in PICVD system19 May 2026US 12,633,502 B2Oerlikon Surface Solutions AG, PfäFfikon
- Vaporizer and ion source12 May 2026US 12,626,888 B2Nissin Ion Equipment Co., Ltd.
- Arc-beam position monitoring and position control in PICVD coating systems17 Mar 2026US 12,577,671 B2Oerlikon Surface Solutions AG, PfäFfikon
- Cascade arc plasma generator1 Oct 2026US 2026/0302133 A1Hefei Institute of Physical Science, Chinese Academy of Sciences
- Contaminant removal device for arc reaction chamber and method thereof25 Jun 2026US 2026/0179890 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Plasma head and plasma generation device11 Jun 2026US 2026/0162934 A1Fuji Corporation
- Electromagnetic pulse apparatus, system, and method11 Jun 2026US 2026/0164530 A1Lake Effect Consortium, LLC
- Device and method for plasma atmosphere control4 Jun 2026US 2026/0155341 A1L' Air Liquide, Societe Anonyme pour I' Etude et I'Exploitation des Procedes Georges Claude
Most cited
By later US patents
- Magnetoplasmadynamic apparatus and process for the separation and deposition of materials173US 4,471,003 A1984
- Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports112US 4,006,340 ACompagnie Industrielle des Telecommunications Cit-Alcatel · 1977
- Filtered cathodic arc deposition method and apparatus107US 7,252,745 B2G & H Technologies, LLC · 2007
- Magnetoplasmadynamic apparatus for the separation and deposition of materials104US 4,487,162 A1984
- Method for the deposition and modification of thin films using a combination of vacuum arcs and plasma immersion ion implantation94US 5,580,429 ANortheastern University · 1996