H01J 37/00
Discharge tubes with provision for introducing objects or material to be exposed
Official title: Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (H01J33/00, H01J40/00, H01J41/00, H01J47/00, H01J49/00 take precedence)
H01J37/00 (Discharge tubes with provision for introducing objects or material to be exposed) appears on 35,405 US grants and 38,877 published applications in this corpus.
Search patents in H01J- Granted patents
- 35,405
- Published applications
- 38,877
- Assignees
- 5,005
- Inventors
- 45,505
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 89 | 0 |
| 1977 | 90 | 0 |
| 1978 | 100 | 0 |
| 1979 | 88 | 0 |
| 1980 | 82 | 0 |
| 1981 | 95 | 0 |
| 1982 | 100 | 0 |
| 1983 | 144 | 0 |
| 1984 | 205 | 0 |
| 1985 | 193 | 0 |
| 1986 | 199 | 0 |
| 1987 | 198 | 0 |
| 1988 | 202 | 0 |
| 1989 | 266 | 0 |
| 1990 | 265 | 0 |
| 1991 | 273 | 0 |
| 1992 | 294 | 0 |
| 1993 | 304 | 0 |
| 1994 | 364 | 0 |
| 1995 | 363 | 0 |
| 1996 | 354 | 0 |
| 1997 | 357 | 0 |
| 1998 | 482 | 0 |
| 1999 | 579 | 0 |
| 2000 | 660 | 0 |
| 2001 | 762 | 325 |
| 2002 | 825 | 861 |
| 2003 | 861 | 980 |
| 2004 | 870 | 1224 |
| 2005 | 730 | 1164 |
| 2006 | 700 | 1211 |
| 2007 | 566 | 1215 |
| 2008 | 669 | 1283 |
| 2009 | 683 | 1283 |
| 2010 | 867 | 1228 |
| 2011 | 840 | 1218 |
| 2012 | 923 | 1204 |
| 2013 | 1025 | 1381 |
| 2014 | 1197 | 1544 |
| 2015 | 1214 | 1886 |
| 2016 | 1380 | 1746 |
| 2017 | 1440 | 1664 |
| 2018 | 1351 | 1590 |
| 2019 | 1530 | 1819 |
| 2020 | 1679 | 2009 |
| 2021 | 1437 | 1957 |
| 2022 | 1494 | 2174 |
| 2023 | 1420 | 2229 |
| 2024 | 1553 | 2100 |
| 2025 | 1744 | 2085 |
| 2026 | 1299 | 1497 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Coated cutting tool with an alternating layer composition6 Oct 2026US 12,752,344 B2Walter AG
- Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus6 Oct 2026US 12,753,480 B2Toto Ltd.
- Film forming method and film forming apparatus6 Oct 2026US 12,753,485 B2Tokyo Electron Limited
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Flow control arrangements, semiconductor processing systems having flow control arrangements, and flow control methods6 Oct 2026US 12,753,499 B2ASM IP Holding B. V.
- Semiconductor cleaning apparatus and method8 Oct 2026US 2026/0307113 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- Sample preparation system for electron microscopy8 Oct 2026US 2026/0309653 A1The Regents of the University of California
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Systems and Methods for Uncertainty-Aware-Single-Particle Cryo-EM Data Collection Using Online Feedback8 Oct 2026US 2026/0311330 A1The Regents of the University of Michigan
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Apparatus and method for growth of a thin film940US 6,511,539 B1ASM America, Inc. · 2003
- Integration of remote plasma generator with semiconductor processing chamber865US 6,387,207 B1APPLIED Materials.Inc. · 2002
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994