H01J 37/32
Gas-filled discharge tubes
Official title: Gas-filled discharge tubes (heating by discharge H05B)
H01J37/32 (Gas-filled discharge tubes) appears on 21,152 US grants and 26,253 published applications in this corpus.
Search patents in H01J- Granted patents
- 21,152
- Published applications
- 26,253
- Assignees
- 3,446
- Inventors
- 30,677
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 20 | 0 |
| 1977 | 22 | 0 |
| 1978 | 21 | 0 |
| 1979 | 25 | 0 |
| 1980 | 24 | 0 |
| 1981 | 32 | 0 |
| 1982 | 43 | 0 |
| 1983 | 62 | 0 |
| 1984 | 93 | 0 |
| 1985 | 78 | 0 |
| 1986 | 94 | 0 |
| 1987 | 63 | 0 |
| 1988 | 60 | 0 |
| 1989 | 98 | 0 |
| 1990 | 120 | 0 |
| 1991 | 109 | 0 |
| 1992 | 130 | 0 |
| 1993 | 180 | 0 |
| 1994 | 209 | 0 |
| 1995 | 216 | 0 |
| 1996 | 224 | 0 |
| 1997 | 244 | 0 |
| 1998 | 291 | 0 |
| 1999 | 363 | 0 |
| 2000 | 463 | 0 |
| 2001 | 512 | 220 |
| 2002 | 545 | 531 |
| 2003 | 453 | 629 |
| 2004 | 504 | 812 |
| 2005 | 372 | 752 |
| 2006 | 312 | 737 |
| 2007 | 274 | 755 |
| 2008 | 294 | 755 |
| 2009 | 321 | 827 |
| 2010 | 449 | 786 |
| 2011 | 451 | 760 |
| 2012 | 510 | 716 |
| 2013 | 525 | 805 |
| 2014 | 600 | 976 |
| 2015 | 688 | 1224 |
| 2016 | 822 | 1172 |
| 2017 | 868 | 1142 |
| 2018 | 856 | 1130 |
| 2019 | 994 | 1255 |
| 2020 | 1091 | 1422 |
| 2021 | 935 | 1436 |
| 2022 | 1032 | 1627 |
| 2023 | 1000 | 1645 |
| 2024 | 1192 | 1544 |
| 2025 | 1321 | 1516 |
| 2026 | 947 | 1079 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/32431Constructional details of the reactor12,569
- H01J 37/32009Arrangements for generation of plasma specially adapted for examination or treatment of11,647
- H01J 37/34Operating with cathodic sputtering3,567
- H01J 37/32917Plasma diagnostics2,785
- H01J 37/36For cleaning surfaces while plating with ions of materials introduced into the15
Recent patents
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- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
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Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Apparatus and method for growth of a thin film940US 6,511,539 B1ASM America, Inc. · 2003
- Integration of remote plasma generator with semiconductor processing chamber865US 6,387,207 B1APPLIED Materials.Inc. · 2002
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998