H01J 37/32431
Constructional details of the reactor
Official title: {Constructional details of the reactor}
H01J37/32431 (Constructional details of the reactor) appears on 12,569 US grants and 17,016 published applications in this corpus.
Search patents in H01J- Granted patents
- 12,569
- Published applications
- 17,016
- Assignees
- 2,156
- Inventors
- 21,151
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 8 | 0 |
| 1978 | 3 | 0 |
| 1979 | 6 | 0 |
| 1980 | 7 | 0 |
| 1981 | 15 | 0 |
| 1982 | 16 | 0 |
| 1983 | 18 | 0 |
| 1984 | 30 | 0 |
| 1985 | 26 | 0 |
| 1986 | 37 | 0 |
| 1987 | 32 | 0 |
| 1988 | 25 | 0 |
| 1989 | 42 | 0 |
| 1990 | 53 | 0 |
| 1991 | 49 | 0 |
| 1992 | 57 | 0 |
| 1993 | 89 | 0 |
| 1994 | 104 | 0 |
| 1995 | 110 | 0 |
| 1996 | 114 | 0 |
| 1997 | 131 | 0 |
| 1998 | 137 | 0 |
| 1999 | 193 | 0 |
| 2000 | 265 | 0 |
| 2001 | 251 | 111 |
| 2002 | 257 | 269 |
| 2003 | 219 | 336 |
| 2004 | 231 | 389 |
| 2005 | 173 | 374 |
| 2006 | 135 | 370 |
| 2007 | 128 | 381 |
| 2008 | 139 | 416 |
| 2009 | 157 | 437 |
| 2010 | 236 | 435 |
| 2011 | 252 | 421 |
| 2012 | 273 | 386 |
| 2013 | 297 | 435 |
| 2014 | 319 | 580 |
| 2015 | 373 | 760 |
| 2016 | 474 | 777 |
| 2017 | 486 | 802 |
| 2018 | 547 | 794 |
| 2019 | 643 | 904 |
| 2020 | 761 | 1027 |
| 2021 | 649 | 1073 |
| 2022 | 767 | 1230 |
| 2023 | 709 | 1261 |
| 2024 | 871 | 1113 |
| 2025 | 958 | 1127 |
| 2026 | 694 | 808 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/3244Gas supply means4,659
- H01J 37/32798Further details of plasma apparatus not provided for in groups h01j37/3244 -2,779
- H01J 37/32715Workpiece holder2,722
- H01J 37/32532Electrodes2,666
- H01J 37/32458Vessel2,232
- H01J 37/32623Mechanical discharge control means2,179
- H01J 37/3266Magnetic control means1,189
- H01J 37/32733Means for moving the material to be treated893
All 9 subgroupsShow fewer
Recent patents
- Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus6 Oct 2026US 12,753,480 B2Toto Ltd.
- Film forming method and film forming apparatus6 Oct 2026US 12,753,485 B2Tokyo Electron Limited
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Flow control arrangements, semiconductor processing systems having flow control arrangements, and flow control methods6 Oct 2026US 12,753,499 B2ASM IP Holding B. V.
- Substrate processing device and method for cleaning substrate processing device6 Oct 2026US 12,753,506 B2Jusung Engineering Co., Ltd.
- Semiconductor cleaning apparatus and method8 Oct 2026US 2026/0307113 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Etching method and plasma processing apparatus8 Oct 2026US 2026/0311969 A1Tokyo Electron Limited
- Showerhead structure, and substrate processing chamber and semiconductor processing apparatus having the same8 Oct 2026US 2026/0311970 A1ASM IP Holding B. V.
- Device for reducing a parasitic plasma and a substrate processing apparatus having the same8 Oct 2026US 2026/0311971 A1ASM IP Holding B. V.
- Integration of vapor deposition process into plasma etch reactor8 Oct 2026US 2026/0311972 A1Lam Research Corporation
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Apparatus and method for growth of a thin film940US 6,511,539 B1ASM America, Inc. · 2003
- Integration of remote plasma generator with semiconductor processing chamber865US 6,387,207 B1APPLIED Materials.Inc. · 2002
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998