H01J 37/32458
Vessel
Official title: {Vessel}
H01J37/32458 (Vessel) appears on 2,232 US grants and 3,247 published applications in this corpus.
Search patents in H01J- Granted patents
- 2,232
- Published applications
- 3,247
- Assignees
- 560
- Inventors
- 5,773
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 10 | 0 |
| 1994 | 6 | 0 |
| 1995 | 11 | 0 |
| 1996 | 20 | 0 |
| 1997 | 23 | 0 |
| 1998 | 25 | 0 |
| 1999 | 33 | 0 |
| 2000 | 59 | 0 |
| 2001 | 61 | 17 |
| 2002 | 54 | 64 |
| 2003 | 47 | 55 |
| 2004 | 59 | 76 |
| 2005 | 31 | 78 |
| 2006 | 27 | 67 |
| 2007 | 20 | 80 |
| 2008 | 17 | 79 |
| 2009 | 25 | 60 |
| 2010 | 49 | 68 |
| 2011 | 46 | 63 |
| 2012 | 35 | 71 |
| 2013 | 40 | 70 |
| 2014 | 52 | 99 |
| 2015 | 62 | 164 |
| 2016 | 72 | 159 |
| 2017 | 91 | 164 |
| 2018 | 111 | 175 |
| 2019 | 116 | 205 |
| 2020 | 163 | 184 |
| 2021 | 136 | 177 |
| 2022 | 132 | 208 |
| 2023 | 117 | 252 |
| 2024 | 168 | 219 |
| 2025 | 189 | 225 |
| 2026 | 111 | 168 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus6 Oct 2026US 12,753,480 B2Toto Ltd.
- Electrostatically secured substrate support assembly6 Oct 2026US 12,755,944 B2APPLIED Materials.Inc.
- Methods for reducing photoresist and carbon etch rates in an ICP process chamber using a silicon-based chamber pre-coat6 Oct 2026US 12,757,659 B2APPLIED Materials.Inc.
- Plasma showerhead assembly and method of reducing defects29 Sep 2026US 12,747,502 B2APPLIED Materials.Inc.
- Corrosion resistant polymer coatings for manufacturing equipment components29 Sep 2026US 12,749,658 B2APPLIED Materials.Inc.
- Device for reducing a parasitic plasma and a substrate processing apparatus having the same8 Oct 2026US 2026/0311971 A1ASM IP Holding B. V.
- Integration of vapor deposition process into plasma etch reactor8 Oct 2026US 2026/0311972 A1Lam Research Corporation
- Shower head and plasma processing apparatus including the same and method of manufacturing a semiconductor device1 Oct 2026US 2026/0302138 A1Samsung Electronics Co., Ltd.
- Method and device for plasma heating of the internal walls of a vacuum furnace1 Oct 2026US 2026/0302140 A1
- Higher pressure purge for impurity reduction in radical treatment chamber1 Oct 2026US 2026/0302143 A1APPLIED Materials.Inc.
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Integration of remote plasma generator with semiconductor processing chamber865US 6,387,207 B1APPLIED Materials.Inc. · 2002
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Process feed management for semiconductor substrate processing741US 9,017,481 B1ASM America, Inc. · 2015
- Temperature control system for semiconductor process chamber652US 6,015,465 AAPPLIED Materials.Inc. · 2000