H01J 37/32477
Characterised by the means for protecting vessels or internal parts
Official title: {characterised by the means for protecting vessels or internal parts, e.g. coatings}
H01J37/32477 (Characterised by the means for protecting vessels or internal parts) appears on 957 US grants and 1,427 published applications in this corpus.
Search patents in H01J- Granted patents
- 957
- Published applications
- 1,427
- Assignees
- 250
- Inventors
- 2,689
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 7 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 9 | 0 |
| 1997 | 12 | 0 |
| 1998 | 11 | 0 |
| 1999 | 13 | 0 |
| 2000 | 21 | 0 |
| 2001 | 31 | 8 |
| 2002 | 19 | 29 |
| 2003 | 19 | 27 |
| 2004 | 27 | 42 |
| 2005 | 12 | 35 |
| 2006 | 13 | 36 |
| 2007 | 11 | 41 |
| 2008 | 4 | 41 |
| 2009 | 12 | 32 |
| 2010 | 28 | 34 |
| 2011 | 21 | 29 |
| 2012 | 23 | 34 |
| 2013 | 15 | 36 |
| 2014 | 24 | 45 |
| 2015 | 23 | 62 |
| 2016 | 33 | 69 |
| 2017 | 46 | 68 |
| 2018 | 48 | 83 |
| 2019 | 37 | 76 |
| 2020 | 63 | 81 |
| 2021 | 45 | 83 |
| 2022 | 61 | 89 |
| 2023 | 61 | 111 |
| 2024 | 75 | 86 |
| 2025 | 71 | 82 |
| 2026 | 49 | 68 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus6 Oct 2026US 12,753,480 B2Toto Ltd.
- Electrostatically secured substrate support assembly6 Oct 2026US 12,755,944 B2APPLIED Materials.Inc.
- Methods for reducing photoresist and carbon etch rates in an ICP process chamber using a silicon-based chamber pre-coat6 Oct 2026US 12,757,659 B2APPLIED Materials.Inc.
- Plasma showerhead assembly and method of reducing defects29 Sep 2026US 12,747,502 B2APPLIED Materials.Inc.
- Corrosion resistant polymer coatings for manufacturing equipment components29 Sep 2026US 12,749,658 B2APPLIED Materials.Inc.
- Structural member24 Sep 2026US 2026/0290758 A1Toto Ltd.
- Real-time detection of particulate matter during deposition chamber manufacturing24 Sep 2026US 2026/0290768 A1APPLIED Materials.Inc.
- Pulsing Remote Plasma For Ion Damage Reduction And Etch Uniformity Improvement17 Sep 2026US 2026/0279732 A1Lam Research Corporation
- A plasma etch-resistant film and a method for its fabrication17 Sep 2026US 2026/0279736 A1Beneq Oy
- Cleancoat and related methods for substrate processing chambers17 Sep 2026US 2026/0279745 A1APPLIED Materials.Inc.
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Plasma processing apparatus577US 6,673,196 B1Tokyo Electron Limited · 2004
- Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput555US 6,589,868 B2APPLIED Materials.Inc. · 2003
- Reactor useful for chemical vapor deposition of titanium nitride526US 6,106,625 AAPPLIED Materials.Inc. · 2000