H01J 37/32495
Means for protecting the vessel against plasma
Official title: {Means for protecting the vessel against plasma}
H01J37/32495 (Means for protecting the vessel against plasma) appears on 363 US grants and 628 published applications in this corpus.
Search patents in H01J- Granted patents
- 363
- Published applications
- 628
- Assignees
- 118
- Inventors
- 1,209
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 5 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 4 | 1 |
| 2002 | 3 | 2 |
| 2003 | 2 | 4 |
| 2004 | 6 | 10 |
| 2005 | 3 | 7 |
| 2006 | 3 | 8 |
| 2007 | 2 | 17 |
| 2008 | 0 | 15 |
| 2009 | 5 | 15 |
| 2010 | 12 | 10 |
| 2011 | 10 | 14 |
| 2012 | 7 | 13 |
| 2013 | 5 | 15 |
| 2014 | 10 | 22 |
| 2015 | 6 | 24 |
| 2016 | 14 | 32 |
| 2017 | 24 | 34 |
| 2018 | 20 | 40 |
| 2019 | 15 | 37 |
| 2020 | 32 | 37 |
| 2021 | 22 | 46 |
| 2022 | 28 | 34 |
| 2023 | 26 | 58 |
| 2024 | 28 | 41 |
| 2025 | 32 | 48 |
| 2026 | 27 | 44 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus6 Oct 2026US 12,753,480 B2Toto Ltd.
- Methods for reducing photoresist and carbon etch rates in an ICP process chamber using a silicon-based chamber pre-coat6 Oct 2026US 12,757,659 B2APPLIED Materials.Inc.
- Corrosion resistant polymer coatings for manufacturing equipment components29 Sep 2026US 12,749,658 B2APPLIED Materials.Inc.
- Composite structure and semiconductor manufacturing apparatus including composite structure8 Sep 2026US 12,729,124 B2Toto Ltd.
- Treated ceramic chamber parts8 Sep 2026US 12,729,166 B2Lam Research Corporation
- Structural member24 Sep 2026US 2026/0290758 A1Toto Ltd.
- Pulsing Remote Plasma For Ion Damage Reduction And Etch Uniformity Improvement17 Sep 2026US 2026/0279732 A1Lam Research Corporation
- A plasma etch-resistant film and a method for its fabrication17 Sep 2026US 2026/0279736 A1Beneq Oy
- Member for plasma processing apparatus and method for manufacturing the same3 Sep 2026US 2026/0258543 A1Hitachi High-Tech Corporation
- Process chamber process kit with protective coating3 Sep 2026US 2026/0260852 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Method for coating internal surface of plasma processing chamber393US 6,875,477 B2Hitachi High-Technologies Corporation · 2005
- Symmetric plasma process chamber389US 9,741,546 B2APPLIED Materials.Inc. · 2017
- Corrosion control for chamber components372US 10,190,701 B2APPLIED Materials.Inc. · 2019
- Low contamination components for semiconductor processing apparatus and methods for making components368US 8,318,327 B2Lam Research Corporation · 2012
- Non-line of sight deposition of erbium based plasma resistant ceramic coating345US 9,850,573 B1APPLIED Materials.Inc. · 2017