Method for coating internal surface of plasma processing chamber
AssigneeHitachi High-Technologies Corporation
InventorsDouglas M. Trickett, Muneo Furuse
Life of this patent
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Abstract
The present invention comprises an aluminum base material 2 constituting the plasma processing chamber of the plasma processing apparatus, a bonding layer 3 deposited on the base material consisting of a transition metal or transition metal alloy that modifies the difference in thermal expansion coefficient of the base material and the material constituting a plasma contact surface, and the plasma contact surface 1 formed of a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and a mixture of La2O3 and Al2O3 being a metal oxide including at least La and O deposited on the bonding layer 3 via a thermal spray process.
Claims7
A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing a mixture of MgAl2O4+LaAlO3 on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and La2O3+Al2O3 on the middle layer via a thermal spray process.
A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing a mixture of MgO+Al2O3+La2O3 on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and La2O3+Al2O3 on the middle layer via a thermal spray process.
A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing LaAlO3 on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La2O3, MgLaAl11O19, and La2O3+Al2O3 on the middle layer via a thermal spray process.
A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing MgAl2O4 on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and La2O3+Al2O3 on the middle layer via a thermal spray process.
A method for coating an internal surface of a plasma processing chamber comprising forming a middle layer by depositing a mixture of MgO+Al2O3+La2O3 on a base material constituting the plasma processing chamber via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and La2O3+Al2O3 on the middle layer via a thermal spray process.
A method for coating an internal surface of a plasma processing chamber comprising forming a middle layer by depositing LaAlO3 on a base material constituting the plasma processing chamber via a thermal spray process, and forming a plasma contact surface by depositing one material selected from a group consisting of La2O3 and La2O3+Al2O3 on the middle layer via a thermal spray process.
A method for coating an internal surface of a plasma processing chamber comprising forming a middle layer by depositing MgAl2O4 on a base material of the plasma processing chamber via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and La2O3+Al2O3 on the middle layer via a thermal spray process.
Dependencies are inferred from the claim text.