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US 2026/0258543 A1Published application
Member for plasma processing apparatus and method for manufacturing the same
AssigneeHitachi High-Tech Corporation
InventorsKazuhiro UEDA, Kazuyuki IKENAGA
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Abstract
The coating film 53 is formed on the base material 52 of a member for a plasma processing apparatus using a suspension plasma spraying method. The suspension liquid 63 used in suspension plasma spraying contains the solvent 62 containing fluorine, a plurality of yttrium fluoride particles, and a plurality of yttrium oxyfluoride particles.
Claims14
A method for manufacturing a member for a plasma processing apparatus, the method comprising:
- (a) a step of preparing a base material used for the member for a plasma processing apparatus;
- (b) a step of preparing a first suspension liquid containing a fluorine-containing solvent, a plurality of yttrium fluoride particles, and a plurality of yttrium oxyfluoride particles;
- and
- (c) a step of forming a coating film on the base material by a suspension plasma spraying method using the first suspension liquid.
1 more element
A member for a plasma processing apparatus, the member comprising:
- a base material;
- and
- a coating film formed on the base material, wherein
- the coating film includes an yttrium fluoride phase and an yttrium oxyfluoride phase,
- an average size of crystallites in the yttrium fluoride phase and an average size of crystallites in the yttrium fluoride phase are each 50 nm or less, and
- a content of yttrium oxide in the coating film is 5% by weight or less.
3 more elements
Dependencies are inferred from the claim text.