Shower head and plasma processing apparatus including the same and method of manufacturing a semiconductor device

A plasma processing apparatus, comprising:

• a chamber having a processing space;
• a chuck disposed in the processing space of the chamber, supporting a substrate and including a lower electrode;
• and
• a shower head disposed in an upper portion of the chamber and opposing the chuck,
• wherein the shower head includes:
• an upper electrode having a first surface exposed to plasma and a second surface opposite to the first surface;
• a cooling plate having a coupling surface opposing the second surface of the upper electrode;
• and
• a magnetic coupling device disposed between the second surface of the upper electrode and the coupling surface of the cooling plate and magnetically coupling the upper electrode to the cooling plate.

A method of manufacturing a semiconductor device, the method comprising:

• loading a substrate into a chamber including a shower head disposed in an upper portion of the chamber;
• and
• supplying a processing gas through the shower head into the chamber in which the substrate is loaded, exciting the processing gas in a plasma state and plasma-processing the substrate,
• wherein the shower head includes:
• an upper electrode having a first surface exposed to plasma and a second surface opposite to the first surface;
• a support member having a coupling surface opposing the second surface of the upper electrode;
• and
• a magnetic coupling device disposed on the second surface of the upper electrode and the coupling surface of the support member and magnetically coupling the upper electrode to the support member.