H01J 37/32917
Plasma diagnostics
Official title: {Plasma diagnostics}
H01J37/32917 (Plasma diagnostics) appears on 2,785 US grants and 3,385 published applications in this corpus.
Search patents in H01J- Granted patents
- 2,785
- Published applications
- 3,385
- Assignees
- 597
- Inventors
- 5,401
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 5 | 0 |
| 1982 | 10 | 0 |
| 1983 | 4 | 0 |
| 1984 | 2 | 0 |
| 1985 | 6 | 0 |
| 1986 | 8 | 0 |
| 1987 | 8 | 0 |
| 1988 | 4 | 0 |
| 1989 | 10 | 0 |
| 1990 | 18 | 0 |
| 1991 | 9 | 0 |
| 1992 | 13 | 0 |
| 1993 | 17 | 0 |
| 1994 | 23 | 0 |
| 1995 | 22 | 0 |
| 1996 | 22 | 0 |
| 1997 | 19 | 0 |
| 1998 | 37 | 0 |
| 1999 | 42 | 0 |
| 2000 | 46 | 0 |
| 2001 | 42 | 19 |
| 2002 | 43 | 47 |
| 2003 | 63 | 83 |
| 2004 | 78 | 138 |
| 2005 | 63 | 135 |
| 2006 | 64 | 118 |
| 2007 | 56 | 98 |
| 2008 | 72 | 98 |
| 2009 | 52 | 120 |
| 2010 | 71 | 97 |
| 2011 | 72 | 58 |
| 2012 | 67 | 83 |
| 2013 | 58 | 74 |
| 2014 | 79 | 91 |
| 2015 | 71 | 115 |
| 2016 | 100 | 164 |
| 2017 | 120 | 157 |
| 2018 | 134 | 162 |
| 2019 | 139 | 139 |
| 2020 | 153 | 154 |
| 2021 | 113 | 193 |
| 2022 | 117 | 183 |
| 2023 | 127 | 212 |
| 2024 | 184 | 244 |
| 2025 | 190 | 231 |
| 2026 | 124 | 172 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,932 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,933 B2Trumpf Huettinger Sp. Z O. O.
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- Plasma processing apparatus and gas exhaust method6 Oct 2026US 12,755,945 B2Hitachi High-Tech Corporation
- Arc current reduction from an electrostatic chuck6 Oct 2026US 12,757,680 B2APPLIED Materials.Inc.
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Detecting and locating anomalous plasma events in multi-station processing chambers8 Oct 2026US 2026/0311976 A1Lam Research Corporation
- Measuring device, measuring method, and vacuum processing apparatus8 Oct 2026US 2026/0311977 A1Tokyo Electron Limited
- Sputtering System with a Plasma Monitoring Device and an Ion Source8 Oct 2026US 2026/0311978 A1Dah Young Vacuum Equipment Co., Ltd.
- Metrology Enclosure Including Spectral Reflectometry System for Plasma Processing System Using Direct-Drive Radiofrequency Power Supply1 Oct 2026US 2026/0302144 A1Lam Research Corporation
Most cited
By later US patents
- Plasma monitoring and control method and system625US 5,576,629 AFourth State Technology, Inc. · 1996
- Method and apparatus for surface treatment by plasma617US 4,579,623 AHitachi, Ltd. · 1986
- Plasma processing method and film forming method509US 7,771,796 B2Tokyo Electron Limited · 2010
- Plasma monitoring and control method and system503US 5,939,886 AAdvanced Energy Industries, Inc. · 1999
- Methods for depositing silicon oxide501US 9,685,320 B2Lam Research Corporation · 2017