H01J 37/3299
Feedback systems
Official title: {Feedback systems}
H01J37/3299 (Feedback systems) appears on 686 US grants and 865 published applications in this corpus.
Search patents in H01J- Granted patents
- 686
- Published applications
- 865
- Assignees
- 193
- Inventors
- 1,663
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 4 | 0 |
| 1994 | 6 | 0 |
| 1995 | 7 | 0 |
| 1996 | 11 | 0 |
| 1997 | 5 | 0 |
| 1998 | 8 | 0 |
| 1999 | 9 | 0 |
| 2000 | 8 | 0 |
| 2001 | 13 | 3 |
| 2002 | 11 | 13 |
| 2003 | 14 | 13 |
| 2004 | 18 | 21 |
| 2005 | 9 | 18 |
| 2006 | 9 | 20 |
| 2007 | 10 | 12 |
| 2008 | 10 | 15 |
| 2009 | 9 | 15 |
| 2010 | 12 | 25 |
| 2011 | 13 | 12 |
| 2012 | 9 | 22 |
| 2013 | 7 | 19 |
| 2014 | 22 | 30 |
| 2015 | 23 | 39 |
| 2016 | 35 | 40 |
| 2017 | 39 | 55 |
| 2018 | 39 | 60 |
| 2019 | 48 | 40 |
| 2020 | 44 | 35 |
| 2021 | 29 | 56 |
| 2022 | 31 | 33 |
| 2023 | 29 | 69 |
| 2024 | 47 | 67 |
| 2025 | 57 | 58 |
| 2026 | 30 | 75 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Arc current reduction from an electrostatic chuck6 Oct 2026US 12,757,680 B2APPLIED Materials.Inc.
- Control system and method for ion energy distribution in plasma process chambers using tailored waveform generators15 Sep 2026US 12,738,450 B2Inspiring Atoms Pte Ltd
- Signal processing system and power supply device having a signal processing system15 Sep 2026US 12,738,466 B2TRUMPF Huettinger GmbH + Co. KG
- Fast frequency tracking control for radiofrequency power amplifiers with rapidly changing plasma loads25 Aug 2026US 12,719,022 B2Advanced Energy Industries, Inc.
- Non-invasive measurement of plasma systems25 Aug 2026US 12,719,034 B2Dublin City University
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Sputtering System with a Plasma Monitoring Device and an Ion Source8 Oct 2026US 2026/0311978 A1Dah Young Vacuum Equipment Co., Ltd.
- Precise Feedback Control of Bias Voltage Tailored Waveform for Plasma Etch Processes1 Oct 2026US 2026/0302146 A1Lam Research Corporation
- Wafer processing method and integrated etching-deposition equipment for wafer processing24 Sep 2026US 2026/0290769 A1Advanced Micro-Fabrication Equipment Inc. China
- Systems and methods for achieving uniformity with multiple coils24 Sep 2026US 2026/0290770 A1Lam Research Corporation
Most cited
By later US patents
- Plasma monitoring and control method and system625US 5,576,629 AFourth State Technology, Inc. · 1996
- Plasma monitoring and control method and system503US 5,939,886 AAdvanced Energy Industries, Inc. · 1999
- Method for controlling cyclic plasma-assisted process484US 8,790,743 B1ASM IP Holding B. V. · 2014
- Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap397US 10,435,790 B2ASM IP Holding B. V. · 2019
- Apparatus and method for efficient and compact remote microwave plasma generation392US 6,029,602 AAPPLIED Materials.Inc. · 2000