Systems and methods for achieving uniformity with multiple coils

A plasma system comprising:

• a plurality of gas sources including a first gas source and a second gas source, wherein the first gas source is configured to store a first gas and the second gas source is configured to store a second gas;
• a plurality of valve control systems, wherein the plurality of valve control systems include a first valve control system and a second valve control system;
• a plurality of valves, wherein the plurality of valves include a first valve and a second valve, wherein the first valve is coupled to the first valve control system and to the first gas source and the second valve is coupled to the second valve control system and to the second gas source;
• a plurality of radio frequency (RF) antennas configured to receive a plurality of RF signals, wherein the plurality of RF antennas includes a first antenna and a second antenna;
• a processor coupled to the plurality of valve control systems, wherein the processor is configured to:
• determine a first parameter from one or more sensor signals received from one or more sensors associated with the first antenna;
• determine a second parameter from the one or more sensor signals received from the one or more sensors associated with the second antenna;
• determine whether the first parameter is within a predetermined parameter threshold range;
• determine whether the second parameter is within the predetermined parameter threshold range;
• and
• modify one or more flow rates of one or more of the first and second gases when it is determined that the first parameter is outside the predetermined parameter threshold range or the second parameter is outside the predetermined parameter threshold range or a combination thereof.

A plasma system comprising:

• a radio frequency (RF) source system configured to generate a plurality of RF signals;
• a plurality of RF antennas coupled to the RF source system to receive the plurality of RF signals, wherein the plurality of RF antennas includes a first antenna and a second antenna;
• a plurality of gas sources including a first gas source and a second gas source, wherein the first gas source is configured to store a first gas and the second gas source is configured to store a second gas;
• a plurality of valve control systems, wherein the plurality of valve control systems include a first valve control system and a second valve control system;
• a plurality of valves, wherein the plurality of valves include a first valve and a second valve, wherein the first valve is coupled to the first valve control system and to the first gas source and the second valve is coupled to the second valve control system and to the second gas source;
• a processor coupled to the RF source system and to the plurality of valve control systems, wherein the processor is configured to:
• determine a first parameter from one or more sensor signals received from one or more sensors associated with the first antenna;
• determine a second parameter from the one or more sensor signals received from the one or more sensors associated with the second antenna;
• determine whether the first parameter is within a predetermined parameter threshold range;
• determine whether the second parameter is within the predetermined parameter threshold range;
• and
• modify a variable of the RF source system or one or more flow rates of one or more of the first and second gases or a combination thereof when it is determined that one of the first and second parameters is outside the predetermined parameter threshold range, wherein the variable or the one or more flow rates or the combination thereof is modified to achieve uniformity across a surface of a substrate.