H01J 37/02
Details
H01J37/02 (Details) appears on 10,142 US grants and 9,984 published applications in this corpus.
Search patents in H01J- Granted patents
- 10,142
- Published applications
- 9,984
- Assignees
- 1,797
- Inventors
- 13,409
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 48 | 0 |
| 1977 | 41 | 0 |
| 1978 | 42 | 0 |
| 1979 | 32 | 0 |
| 1980 | 36 | 0 |
| 1981 | 36 | 0 |
| 1982 | 38 | 0 |
| 1983 | 48 | 0 |
| 1984 | 74 | 0 |
| 1985 | 65 | 0 |
| 1986 | 64 | 0 |
| 1987 | 86 | 0 |
| 1988 | 79 | 0 |
| 1989 | 96 | 0 |
| 1990 | 88 | 0 |
| 1991 | 101 | 0 |
| 1992 | 88 | 0 |
| 1993 | 72 | 0 |
| 1994 | 83 | 0 |
| 1995 | 78 | 0 |
| 1996 | 67 | 0 |
| 1997 | 50 | 0 |
| 1998 | 92 | 0 |
| 1999 | 85 | 0 |
| 2000 | 84 | 0 |
| 2001 | 111 | 46 |
| 2002 | 144 | 154 |
| 2003 | 189 | 174 |
| 2004 | 181 | 236 |
| 2005 | 201 | 224 |
| 2006 | 215 | 284 |
| 2007 | 177 | 297 |
| 2008 | 245 | 381 |
| 2009 | 240 | 336 |
| 2010 | 277 | 327 |
| 2011 | 267 | 340 |
| 2012 | 295 | 366 |
| 2013 | 359 | 402 |
| 2014 | 453 | 415 |
| 2015 | 411 | 533 |
| 2016 | 433 | 470 |
| 2017 | 466 | 456 |
| 2018 | 418 | 391 |
| 2019 | 451 | 508 |
| 2020 | 529 | 579 |
| 2021 | 452 | 518 |
| 2022 | 456 | 536 |
| 2023 | 393 | 547 |
| 2024 | 364 | 539 |
| 2025 | 411 | 547 |
| 2026 | 331 | 378 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/04Arrangements of electrodes and associated parts for generating or controlling the discharge5,469
- H01J 37/20Means for supporting or positioning the object or the material2,181
- H01J 37/244Detectors1,985
- H01J 37/22Optical , image processing or photographic arrangements associated with the tube1,592
- H01J 37/18Vacuum locks623
- H01J 37/21Means for adjusting the focus402
- H01J 37/24Circuit arrangements not adapted to a particular application of the tube and378
- H01J 37/026Means for avoiding or neutralising unwanted electrical charges on tube components348
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Deflector for a charged particle beam apparatus, deflecting system, charged particle beam apparatus, and method of fabricating a deflector6 Oct 2026US 12,755,923 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- System and method for fully integrated microcrystal electron diffraction (MicroED)6 Oct 2026US 12,755,925 B2The Regents of the University of California
- Sample image observation device and method6 Oct 2026US 12,755,926 B2Hitachi High-Tech Corporation
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Systems and Methods for Uncertainty-Aware-Single-Particle Cryo-EM Data Collection Using Online Feedback8 Oct 2026US 2026/0311330 A1The Regents of the University of Michigan
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Ion generators of ion implanters with movable repeller8 Oct 2026US 2026/0311954 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Correcting for grid distortion8 Oct 2026US 2026/0311956 A1ASML Netherlands B. V.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation528US 7,476,291 B2Lam Research Corporation · 2009
- Process for surface treatment519US 4,857,137 AHitachi, Ltd. · 1989
- Substrate clamping technique in IC fabrication processes451US 4,184,188 AVeeco Instruments Inc. · 1980
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992