H01J 37/04
Arrangements of electrodes and associated parts for generating or controlling the discharge
Official title: Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement {(H01J37/32009, H01J37/32623, H01J37/3266, H01J37/32697 take precedence; electron or ion-optical systems for localised treatment of objects H01J37/3007)}
H01J37/04 (Arrangements of electrodes and associated parts for generating or controlling the discharge) appears on 5,469 US grants and 5,356 published applications in this corpus.
Search patents in H01J- Granted patents
- 5,469
- Published applications
- 5,356
- Assignees
- 1,051
- Inventors
- 7,141
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 31 | 0 |
| 1977 | 25 | 0 |
| 1978 | 25 | 0 |
| 1979 | 14 | 0 |
| 1980 | 15 | 0 |
| 1981 | 22 | 0 |
| 1982 | 21 | 0 |
| 1983 | 31 | 0 |
| 1984 | 38 | 0 |
| 1985 | 32 | 0 |
| 1986 | 36 | 0 |
| 1987 | 39 | 0 |
| 1988 | 44 | 0 |
| 1989 | 51 | 0 |
| 1990 | 52 | 0 |
| 1991 | 53 | 0 |
| 1992 | 45 | 0 |
| 1993 | 33 | 0 |
| 1994 | 35 | 0 |
| 1995 | 27 | 0 |
| 1996 | 32 | 0 |
| 1997 | 22 | 0 |
| 1998 | 50 | 0 |
| 1999 | 54 | 0 |
| 2000 | 52 | 0 |
| 2001 | 68 | 29 |
| 2002 | 80 | 89 |
| 2003 | 103 | 95 |
| 2004 | 101 | 131 |
| 2005 | 112 | 128 |
| 2006 | 122 | 153 |
| 2007 | 94 | 172 |
| 2008 | 130 | 213 |
| 2009 | 150 | 185 |
| 2010 | 167 | 172 |
| 2011 | 144 | 171 |
| 2012 | 164 | 185 |
| 2013 | 173 | 195 |
| 2014 | 232 | 223 |
| 2015 | 216 | 274 |
| 2016 | 231 | 233 |
| 2017 | 235 | 260 |
| 2018 | 232 | 237 |
| 2019 | 275 | 288 |
| 2020 | 300 | 313 |
| 2021 | 258 | 250 |
| 2022 | 224 | 266 |
| 2023 | 202 | 306 |
| 2024 | 196 | 280 |
| 2025 | 209 | 301 |
| 2026 | 172 | 207 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/147Arrangements for directing or deflecting the discharge along a desired path1,418
- H01J 37/08Ion sources1,347
- H01J 37/10Lenses1,144
- H01J 37/06Electron sources1,035
- H01J 37/153Electron-optical or ion-optical arrangements for the correction of image defects646
- H01J 37/05Electron or ion-optical arrangements for separating electrons or ions according to their545
- H01J 37/09Diaphragms544
- H01J 37/045Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the386
Recent patents
- Deflector for a charged particle beam apparatus, deflecting system, charged particle beam apparatus, and method of fabricating a deflector6 Oct 2026US 12,755,923 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- System and method for fully integrated microcrystal electron diffraction (MicroED)6 Oct 2026US 12,755,925 B2The Regents of the University of California
- Pixel elements, particle beam microscopes including the same, and associated methods6 Oct 2026US 12,755,927 B2FEI Company
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Ion generators of ion implanters with movable repeller8 Oct 2026US 2026/0311954 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Correcting for grid distortion8 Oct 2026US 2026/0311956 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992
- Object-processing apparatus controlling production of particles in electric field or magnetic field380US 8,051,799 B2Renesas Electronics Corporation · 2011
- Beam processing apparatus350US 6,849,857 B2Ebara Corporation · 2005
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984