H01J 37/08
Ion sources
Official title: Ion sources; Ion guns
H01J37/08 (Ion sources) appears on 1,347 US grants and 1,397 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,347
- Published applications
- 1,397
- Assignees
- 382
- Inventors
- 2,136
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 7 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 4 | 0 |
| 1980 | 4 | 0 |
| 1981 | 7 | 0 |
| 1982 | 1 | 0 |
| 1983 | 6 | 0 |
| 1984 | 8 | 0 |
| 1985 | 6 | 0 |
| 1986 | 6 | 0 |
| 1987 | 12 | 0 |
| 1988 | 15 | 0 |
| 1989 | 10 | 0 |
| 1990 | 11 | 0 |
| 1991 | 10 | 0 |
| 1992 | 11 | 0 |
| 1993 | 3 | 0 |
| 1994 | 6 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 0 | 0 |
| 1998 | 9 | 0 |
| 1999 | 12 | 0 |
| 2000 | 10 | 0 |
| 2001 | 10 | 6 |
| 2002 | 11 | 27 |
| 2003 | 25 | 28 |
| 2004 | 23 | 34 |
| 2005 | 26 | 32 |
| 2006 | 25 | 40 |
| 2007 | 26 | 59 |
| 2008 | 25 | 54 |
| 2009 | 53 | 61 |
| 2010 | 47 | 53 |
| 2011 | 42 | 53 |
| 2012 | 50 | 63 |
| 2013 | 52 | 62 |
| 2014 | 71 | 65 |
| 2015 | 66 | 70 |
| 2016 | 59 | 65 |
| 2017 | 76 | 71 |
| 2018 | 62 | 69 |
| 2019 | 90 | 62 |
| 2020 | 73 | 76 |
| 2021 | 54 | 57 |
| 2022 | 51 | 56 |
| 2023 | 44 | 53 |
| 2024 | 47 | 54 |
| 2025 | 37 | 71 |
| 2026 | 38 | 56 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Focused ion beam apparatus and control method thereof29 Sep 2026US 12,749,647 B2Samsung Electronics Co., Ltd.
- Ion implanter and linear accelerator having polygonal backbone29 Sep 2026US 12,750,942 B2APPLIED Materials.Inc.
- Focused ion beam device8 Sep 2026US 12,731,755 B2Hitachi High-Tech Science Corporation
- Captive spring hooks for reduced electrostatic stress1 Sep 2026US 12,725,754 B2APPLIED Materials.Inc.
- Ion source containing a sputter target25 Aug 2026US 12,719,007 B2APPLIED Materials.Inc.
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Ion generators of ion implanters with movable repeller8 Oct 2026US 2026/0311954 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion source and ion implanter having ion source1 Oct 2026US 2026/0302124 A1Nissin Ion Equipment Co., Ltd.
- Method and apparatus for continuous chained energy ion implantation1 Oct 2026US 2026/0302126 A1Axcelis Technologies, Inc.
- Blended energy implant17 Sep 2026US 2026/0279718 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992
- Beam processing apparatus350US 6,849,857 B2Ebara Corporation · 2005
- Ion source231US 6,645,301 B2Saintech Pty Ltd. · 2003
- Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon122US 5,858,477 AAkashic Memories Corporation · 1999
- Electron cyclotron resonance plasma source110US 4,778,561 AVeeco Instruments Inc. · 1988