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US 12,749,647 B2Granted
Focused ion beam apparatus and control method thereof
AssigneeSamsung Electronics Co., Ltd.
InventorsYeoseon Choi, Donghoon Kwon
Life of this patent
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Abstract
A focused ion beam apparatus may include an ion beam emitter for emitting an ion beam, a focused ion beam chamber into which ion gas may be introduced, a sample stage in the focused ion beam chamber to support a wafer sample, and an air bag in the focused ion beam chamber. The airbag may be positioned to not interfere with the sample stage.
Claims20
A focused ion beam apparatus comprising:
- an ion beam emitter configured to emit an ion beam;
- a focused ion beam chamber for having ion gas introduced therein;
- a sample stage in the focused ion beam chamber, the sample stage being configured to support a wafer sample;
- and
- an airbag in the focused ion beam chamber, the airbag arranged to not interfere with the sample stage, wherein
- the airbag is spaced apart from an outer edge of the sample stage in an outer periphery of the sample stage, and
- the airbag is configured to inflate before evacuating the focused ion beam chamber to reduce an effective volume being evacuated in the focused ion beam chamber.
4 more elements
A focused ion beam apparatus comprising:
- a focused ion beam chamber in which a sample stage configured to support a wafer sample is disposed;
- and
- an airbag in the focused ion beam chamber, the airbag being configured to inflate before evacuating the focused ion beam chamber to reduce an effective volume being evacuated in the focused ion beam chamber,
- the airbag is spaced apart from an outer edge of the sample stage in an outer periphery of the sample stage.
1 more element
A method of controlling a focused ion beam apparatus, the method comprising:
- attaching a wafer sample on a sample stage in a focused ion beam chamber;
- filling an airbag with air, the airbag being installed in a position in the focused ion beam chamber that does not interfere with the sample stage;
- and
- evacuating the focused ion beam chamber after filling the airbag with air, wherein the airbag is spaced apart from an outer edge of the sample stage in an outer periphery of the sample stage, wherein
- the airbag is configured to inflate before evacuating the focused ion beam chamber to reduce an effective volume being evacuated in the focused ion beam chamber.
2 more elements
Dependencies are inferred from the claim text.