H01J 37/153
Electron-optical or ion-optical arrangements for the correction of image defects
Official title: Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
H01J37/153 (Electron-optical or ion-optical arrangements for the correction of image defects) appears on 646 US grants and 652 published applications in this corpus.
Search patents in H01J- Granted patents
- 646
- Published applications
- 652
- Assignees
- 145
- Inventors
- 932
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 1 | 0 |
| 1978 | 5 | 0 |
| 1979 | 2 | 0 |
| 1980 | 4 | 0 |
| 1981 | 1 | 0 |
| 1982 | 3 | 0 |
| 1983 | 6 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 6 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 8 | 0 |
| 1999 | 4 | 0 |
| 2000 | 9 | 0 |
| 2001 | 10 | 1 |
| 2002 | 9 | 5 |
| 2003 | 11 | 13 |
| 2004 | 12 | 20 |
| 2005 | 16 | 25 |
| 2006 | 21 | 22 |
| 2007 | 13 | 27 |
| 2008 | 27 | 29 |
| 2009 | 17 | 26 |
| 2010 | 24 | 21 |
| 2011 | 19 | 18 |
| 2012 | 21 | 12 |
| 2013 | 18 | 22 |
| 2014 | 29 | 19 |
| 2015 | 18 | 12 |
| 2016 | 18 | 17 |
| 2017 | 19 | 22 |
| 2018 | 19 | 25 |
| 2019 | 30 | 32 |
| 2020 | 32 | 33 |
| 2021 | 24 | 36 |
| 2022 | 35 | 42 |
| 2023 | 29 | 47 |
| 2024 | 25 | 46 |
| 2025 | 30 | 48 |
| 2026 | 38 | 32 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Deflector for a charged particle beam apparatus, deflecting system, charged particle beam apparatus, and method of fabricating a deflector6 Oct 2026US 12,755,923 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Multipole elements and charged particle microscope systems including the same29 Sep 2026US 12,749,646 B2FEI Company
- Hybrid background extraction in electron holography15 Sep 2026US 12,738,444 B2FEI Company
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Correcting for grid distortion8 Oct 2026US 2026/0311956 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- System and Method for Extending Faraday Setup Cup Life Time by Scanning Ion Beam during Setup1 Oct 2026US 2026/0302125 A1APPLIED Materials.Inc.
- Distortion optimized multi-beam scanning system24 Sep 2026US 2026/0290744 A1Carl Zeiss MultiSEM GmbH
- Method for finding optimal image contrast when using a laser phase plate17 Sep 2026US 2026/0279719 A1FEI Company
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Electron beam exposure apparatus and method, and device manufacturing method80US 5,834,783 ACanon Kabushiki Kaisha · 1998
- Electron beam exposure apparatus and method, and device manufacturing method73US 6,323,499 B1Canon Kabushiki Kaisha · 2001