H01J 37/10
Lenses
H01J37/10 (Lenses) appears on 1,144 US grants and 1,183 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,144
- Published applications
- 1,183
- Assignees
- 247
- Inventors
- 1,666
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 6 | 0 |
| 1981 | 2 | 0 |
| 1982 | 4 | 0 |
| 1983 | 6 | 0 |
| 1984 | 7 | 0 |
| 1985 | 9 | 0 |
| 1986 | 7 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 10 | 0 |
| 1990 | 12 | 0 |
| 1991 | 11 | 0 |
| 1992 | 4 | 0 |
| 1993 | 7 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 10 | 0 |
| 1999 | 10 | 0 |
| 2000 | 12 | 0 |
| 2001 | 12 | 2 |
| 2002 | 16 | 15 |
| 2003 | 17 | 14 |
| 2004 | 7 | 19 |
| 2005 | 31 | 20 |
| 2006 | 15 | 16 |
| 2007 | 16 | 16 |
| 2008 | 15 | 23 |
| 2009 | 15 | 23 |
| 2010 | 14 | 16 |
| 2011 | 21 | 20 |
| 2012 | 22 | 31 |
| 2013 | 25 | 34 |
| 2014 | 39 | 42 |
| 2015 | 41 | 69 |
| 2016 | 57 | 50 |
| 2017 | 51 | 72 |
| 2018 | 59 | 57 |
| 2019 | 69 | 83 |
| 2020 | 76 | 103 |
| 2021 | 80 | 84 |
| 2022 | 76 | 77 |
| 2023 | 74 | 85 |
| 2024 | 42 | 83 |
| 2025 | 59 | 74 |
| 2026 | 45 | 55 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- System and method for fully integrated microcrystal electron diffraction (MicroED)6 Oct 2026US 12,755,925 B2The Regents of the University of California
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Aberration correction systems and charged particle microscope systems including the same29 Sep 2026US 12,749,644 B2FEI Company
- Charged particle beam device and specimen observation method15 Sep 2026US 12,738,442 B2Hitachi High-Tech Corporation
- Fiber Fabry-Perot Cavity laser phase plate for charged particle microscopy1 Sep 2026US 12,725,756 B2FEI Company
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Charged particle beam device and method17 Sep 2026US 2026/0279720 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Multi-beam charged particle microscope design with improved detection system for secondary electron imaging over a large range of landing energies of primary electrons17 Sep 2026US 2026/0279723 A1
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Objective lens with deflector plates immersed in electrostatic lens field110US 8,698,093 B1KLA-Tencor Corporation · 2014
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Electrostatic lens to focus an ion beam to uniform density96US 4,002,912 AThe United States of America as represented by the United States Energy Research and Development Administration · 1977
- Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses92US 6,617,595 B1Canon Kabushiki Kaisha · 2003