Assessment system, method of assessing
AssigneeASML Netherlands B.V.
InventorMarco Jan-Jaco Wieland
Life of this patent
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AssigneeASML Netherlands B.V.
InventorMarco Jan-Jaco Wieland
Estimating the term…
Assessment systems and methods are disclosed. In one arrangement, charged particles are directed in sub-beams arranged in a multi-beam towards a sample. A plurality of control electrodes define a control lens array. Each control lens in the control lens array is aligned with a sub-beam path of a respective sub-beam of the multi-beam and configured to operate on the respective sub-beam. A plurality of objective electrodes define an objective lens array that directs the sub-beams onto a sample. Objective lenses are aligned with a sub-beam path aligned with a respective control lens. Selectable landing energies are implemented for a sub-beam of the multi-beam by applying corresponding potentials to the control electrodes and the objective electrodes. A controller is configured to select corresponding potentials so a spatial relationship between an image plane of the system and all control electrodes and objective electrodes is the same for each selectable landing energy.
An assessment system configured to direct charged particles in sub-beams arranged in a multi-beam towards a sample, the system comprising:
A method of using an assessment system that directs charged particles in sub-beams arranged in a multi-beam towards a sample, the system comprising control electrodes for operating on a multi-beam of sub-beams and objective electrodes for focusing the sub-beams onto an image plane, the image plane of the system and all of the control electrodes and objective electrodes having a fixed spatial relationship, the method comprising:
An assessment system configured to direct charged particles in a multi-beam towards a sample, the system comprising:
Dependencies are inferred from the claim text.