H01J 37/12
Electrostatic
Official title: electrostatic
H01J37/12 (Electrostatic) appears on 360 US grants and 404 published applications in this corpus.
Search patents in H01J- Granted patents
- 360
- Published applications
- 404
- Assignees
- 122
- Inventors
- 675
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 5 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 2 | 0 |
| 2001 | 8 | 1 |
| 2002 | 1 | 3 |
| 2003 | 4 | 7 |
| 2004 | 1 | 6 |
| 2005 | 12 | 12 |
| 2006 | 8 | 5 |
| 2007 | 8 | 7 |
| 2008 | 8 | 10 |
| 2009 | 5 | 7 |
| 2010 | 3 | 8 |
| 2011 | 8 | 11 |
| 2012 | 10 | 8 |
| 2013 | 12 | 16 |
| 2014 | 17 | 17 |
| 2015 | 12 | 13 |
| 2016 | 12 | 15 |
| 2017 | 13 | 25 |
| 2018 | 21 | 15 |
| 2019 | 12 | 19 |
| 2020 | 23 | 33 |
| 2021 | 21 | 28 |
| 2022 | 21 | 25 |
| 2023 | 22 | 34 |
| 2024 | 21 | 29 |
| 2025 | 18 | 25 |
| 2026 | 18 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Objective lenses, charged particle microscopes including the same, and associated methods25 Aug 2026US 12,719,009 B2FEI Company
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- System and method for adjusting an ion beam10 Sep 2026US 2026/0269182 A1APPLIED Materials.Inc.
- Electron-optical plate20 Aug 2026US 2026/0245825 A1ASML Netherlands B. V.
- Charged particle beam writing apparatus, drift amount calculation method, and charged particle beam writing method20 Aug 2026US 2026/0245830 A1NuFlare Technology, Inc.
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Electrostatic lens to focus an ion beam to uniform density96US 4,002,912 AThe United States of America as represented by the United States Energy Research and Development Administration · 1977
- Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses92US 6,617,595 B1Canon Kabushiki Kaisha · 2003
- Illumination system for electron beam lithography tool63US 6,333,508 B1Elith LLC · 2001
- Electrostatic emission lens55US 4,255,661 AMax-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V. · 1981