H01J 37/05
Electron or ion-optical arrangements for separating electrons or ions according to their
Official title: Electron or ion-optical arrangements for separating electrons or ions according to their energy {or mass}(particle separator tubes H01J49/00)
H01J37/05 (Electron or ion-optical arrangements for separating electrons or ions according to their) appears on 545 US grants and 483 published applications in this corpus.
Search patents in H01J- Granted patents
- 545
- Published applications
- 483
- Assignees
- 172
- Inventors
- 802
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 4 | 0 |
| 1988 | 8 | 0 |
| 1989 | 8 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 5 | 0 |
| 1993 | 3 | 0 |
| 1994 | 6 | 0 |
| 1995 | 6 | 0 |
| 1996 | 5 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 8 | 0 |
| 2001 | 4 | 3 |
| 2002 | 15 | 8 |
| 2003 | 9 | 5 |
| 2004 | 11 | 13 |
| 2005 | 12 | 12 |
| 2006 | 16 | 23 |
| 2007 | 9 | 14 |
| 2008 | 20 | 18 |
| 2009 | 16 | 20 |
| 2010 | 19 | 23 |
| 2011 | 21 | 12 |
| 2012 | 17 | 22 |
| 2013 | 19 | 14 |
| 2014 | 18 | 17 |
| 2015 | 23 | 23 |
| 2016 | 26 | 23 |
| 2017 | 23 | 22 |
| 2018 | 25 | 30 |
| 2019 | 24 | 34 |
| 2020 | 36 | 33 |
| 2021 | 33 | 28 |
| 2022 | 19 | 24 |
| 2023 | 20 | 20 |
| 2024 | 15 | 13 |
| 2025 | 13 | 18 |
| 2026 | 7 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Energy filter assembly for ion implantation system with at least one coupling element8 Sep 2026US 12,731,753 B2Mi2-Factory GmbH
- Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus19 May 2026US 12,633,489 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Multi-beam charged particle system and method of controlling the working distance in a multi-beam charged particle system21 Apr 2026US 12,609,282 B2Carl Zeiss MultiSEM GmbH
- Apparatus, system and method for energy spread ion beam31 Mar 2026US 12,592,359 B2APPLIED Materials.Inc.
- High incidence angle graphite for particle control with dedicated low sputter yield ion beam10 Mar 2026US 12,571,088 B2Axcelis Technologies, Inc.
- Method, apparatus and system for characterizing energetic neutral component of a particle beam24 Sep 2026US 2026/0290741 A1Axcelis Technologies, Inc.
- Focused ion beam system with single optical column17 Sep 2026US 2026/0279716 A1Ales Tech Inc.
- Ion implanter30 Jul 2026US 2026/0221385 A1Nissin Ion Equipment Co., Ltd.
- Charged particle beam energy width reduction apparatus, method of operating thereof, and charged particle beam device11 Jun 2026US 2026/0162924 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Spectroscopy-based safety system for nuclear reaction detection in an ion implantation system30 Apr 2026US 2026/0120994 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Low energy, steered ion beam deposition system having high current at low pressure116US 5,206,516 AInternational Business Machines Corporation · 1993
- Compact high current broad beam ion implanter103US 5,350,926 ADiamond Semiconductor Group, Inc. · 1994
- Electrical process monitoring using mirror-mode electron microscopy85US 7,514,681 B1KLA-Tencor Technologies Corporation · 2009
- Testing apparatus using charged particles and device manufacturing method using the testing apparatus76US 7,138,629 B2Ebara Corporation · 2006
- Apparatus and methods for ion implantation67US 4,847,504 AAPPLIED Materials.Inc. · 1989