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US 12,592,359 B2Granted
Apparatus, system and method for energy spread ion beam
AssigneeApplied Materials, Inc.
InventorsPaul J. Murphy, Frank Sinclair, Jun Lu, Daniel Tieger, Anthony Renau
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Abstract
An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.
Claims9
An ion implanter, comprising:
- an ion source arranged to generate an ion beam;
- a scanner disposed downstream of the ion source in a direction of travel of the ion beam;
- and
- an energy spreading electrode assembly disposed downstream of the scanner, to receive the ion beam and to apply a time varying voltage bias signal between a plurality of electrodes of the energy spreading electrode assembly to generate an energy spread of the ion beam.
1 more element
Dependencies are inferred from the claim text.