H01J 37/09
Diaphragms
Official title: Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
H01J37/09 (Diaphragms) appears on 544 US grants and 588 published applications in this corpus.
Search patents in H01J- Granted patents
- 544
- Published applications
- 588
- Assignees
- 187
- Inventors
- 1,243
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 0 | 0 |
| 1981 | 4 | 0 |
| 1982 | 3 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 4 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 6 | 0 |
| 1991 | 7 | 0 |
| 1992 | 5 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 7 | 0 |
| 2000 | 1 | 0 |
| 2001 | 8 | 5 |
| 2002 | 5 | 8 |
| 2003 | 3 | 5 |
| 2004 | 6 | 6 |
| 2005 | 6 | 6 |
| 2006 | 4 | 17 |
| 2007 | 7 | 13 |
| 2008 | 10 | 27 |
| 2009 | 16 | 23 |
| 2010 | 20 | 16 |
| 2011 | 17 | 24 |
| 2012 | 20 | 20 |
| 2013 | 18 | 19 |
| 2014 | 22 | 22 |
| 2015 | 20 | 20 |
| 2016 | 21 | 24 |
| 2017 | 27 | 28 |
| 2018 | 18 | 29 |
| 2019 | 35 | 26 |
| 2020 | 24 | 42 |
| 2021 | 33 | 27 |
| 2022 | 26 | 40 |
| 2023 | 30 | 41 |
| 2024 | 25 | 38 |
| 2025 | 25 | 35 |
| 2026 | 25 | 27 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron-optical assembly comprising electromagnetic shielding8 Sep 2026US 12,731,754 B2ASML Netherlands B. V.
- Focused ion beam device8 Sep 2026US 12,731,755 B2Hitachi High-Tech Science Corporation
- Beam detector, multi-charged-particle-beam irradiation apparatus, and adjustment method for beam detector8 Sep 2026US 12,731,759 B2NuFlare Technology, Inc.
- Objective lenses, charged particle microscopes including the same, and associated methods25 Aug 2026US 12,719,009 B2FEI Company
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Shield arrangement for electron-optical module24 Sep 2026US 2026/0290742 A1ASML Netherlands B. V.
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Charged particle beam device17 Sep 2026US 2026/0279717 A1Samsung Electronics Co., Ltd.
- Particle beam system13 Aug 2026US 2026/0237594 A1Carl Zeiss Microscopy GmbH
Most cited
By later US patents
- Object-processing apparatus controlling production of particles in electric field or magnetic field380US 8,051,799 B2Renesas Electronics Corporation · 2011
- Diaphragm system for generating a plurality of particle probes haivng variable cross section151US 4,899,060 ASiemens Aktiengesellschaft · 1990
- Charged particle beam exposure system and charged particle beam exposure method135US 5,260,579 AFujitsu Limited · 1993
- Multi beam charged particle device101US 6,943,349 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2005
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007