Process for surface treatment
AssigneeHitachi, Ltd.
InventorsShinichi Tachi, Sadayuki Okudaira, Kazunori Tsujimoto, Kiichiro Mukai
Life of this patent
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Abstract
An ion beam is allowed to hit the surface of a target and the resulting forward scattered particle beam is then allowed to hit the surface of a workpiece, thereby etching or modifying the surface of the workpiece or depositing a film on the surface of the workpiece. By bombardment of ions with the target, electric charges possessed by the ion beam are lost, and only the thus neutralized forward scattered particle beam is allowed to hit the surface of the workpiece, and thus the said surface treatment can be carried out without any electrically charging trouble.
Claims17
A process for surface treatment, which comprises striking the surface of a solid target with an ion beam comprising at least one element species to thereby forward scattering particles and produce a forward scattered particle beam comprising said at least one element species, and then directing the forward scattered particle beam toward the surface of a workpiece, striking the workpiece surface to etch or modify the surface of the workpiece or deposit a film on the surface of the workpiece.
Dependencies are inferred from the claim text.