H01J 37/21
Means for adjusting the focus
H01J37/21 (Means for adjusting the focus) appears on 402 US grants and 413 published applications in this corpus.
Search patents in H01J- Granted patents
- 402
- Published applications
- 413
- Assignees
- 114
- Inventors
- 911
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 3 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 5 | 0 |
| 1992 | 5 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 2 |
| 2002 | 7 | 6 |
| 2003 | 8 | 5 |
| 2004 | 5 | 8 |
| 2005 | 9 | 12 |
| 2006 | 8 | 14 |
| 2007 | 8 | 10 |
| 2008 | 15 | 16 |
| 2009 | 6 | 12 |
| 2010 | 10 | 9 |
| 2011 | 11 | 11 |
| 2012 | 11 | 8 |
| 2013 | 8 | 7 |
| 2014 | 12 | 11 |
| 2015 | 13 | 22 |
| 2016 | 18 | 19 |
| 2017 | 12 | 18 |
| 2018 | 20 | 13 |
| 2019 | 22 | 35 |
| 2020 | 26 | 26 |
| 2021 | 22 | 21 |
| 2022 | 22 | 24 |
| 2023 | 20 | 35 |
| 2024 | 11 | 24 |
| 2025 | 23 | 27 |
| 2026 | 17 | 18 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron beam application apparatus and inspection method25 Aug 2026US 12,719,008 B2Hitachi High-Tech Corporation
- Charged particle beam apparatus25 Aug 2026US 12,719,013 B2Hitachi High-Tech Corporation
- Microscope system11 Aug 2026US 12,704,707 B2Hitachi High-Tech Corporation
- Method of determining a beam convergence of a charged particle beam, and charged particle beam system28 Jul 2026US 12,695,050 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Multiple particle beam system with a mirror mode of operation, method for operating a multiple particle beam system with a mirror mode of operation and associated computer program product14 Jul 2026US 12,683,117 B2Carl Zeiss MultiSEM GmbH
- Method for operating a particle beam apparatus, computer program product and particle beam apparatus for carrying out the method8 Oct 2026US 2026/0311958 A1Carl Zeiss Microscopy GmbH
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Polarized light bright field imaging in charged particle beam systems27 Aug 2026US 2026/0253832 A1FEI Company
- Method for operating a multiple particle beam system, calibration method for a multiple particle beam system, computer program product and multiple particle beam system with increased performance6 Aug 2026US 2026/0229444 A1
- Ion Beam Adjustment Method and Ion Beam Device23 Jul 2026US 2026/0213116 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Apparatus and method for reviewing defects on an object111US 6,407,373 B1APPLIED Materials.Inc. · 2002
- Automatic focusing system for scanning electron microscope equipped with laser defect detection function103US 6,621,082 B2Seiko Instruments Inc. · 2003
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Image-formation apparatus using charged particle beams under various focus conditions68US 6,538,249 B1Hitachi, Ltd. · 2003