H01J 37/20
Means for supporting or positioning the object or the material
Official title: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
H01J37/20 (Means for supporting or positioning the object or the material) appears on 2,181 US grants and 2,443 published applications in this corpus.
Search patents in H01J- Granted patents
- 2,181
- Published applications
- 2,443
- Assignees
- 595
- Inventors
- 4,268
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 3 | 0 |
| 1978 | 3 | 0 |
| 1979 | 5 | 0 |
| 1980 | 5 | 0 |
| 1981 | 6 | 0 |
| 1982 | 1 | 0 |
| 1983 | 4 | 0 |
| 1984 | 9 | 0 |
| 1985 | 8 | 0 |
| 1986 | 13 | 0 |
| 1987 | 15 | 0 |
| 1988 | 12 | 0 |
| 1989 | 11 | 0 |
| 1990 | 11 | 0 |
| 1991 | 12 | 0 |
| 1992 | 9 | 0 |
| 1993 | 17 | 0 |
| 1994 | 16 | 0 |
| 1995 | 10 | 0 |
| 1996 | 13 | 0 |
| 1997 | 8 | 0 |
| 1998 | 9 | 0 |
| 1999 | 7 | 0 |
| 2000 | 5 | 0 |
| 2001 | 8 | 5 |
| 2002 | 17 | 30 |
| 2003 | 20 | 26 |
| 2004 | 30 | 48 |
| 2005 | 44 | 43 |
| 2006 | 44 | 42 |
| 2007 | 33 | 65 |
| 2008 | 41 | 71 |
| 2009 | 40 | 76 |
| 2010 | 48 | 84 |
| 2011 | 55 | 80 |
| 2012 | 59 | 74 |
| 2013 | 79 | 84 |
| 2014 | 88 | 93 |
| 2015 | 96 | 158 |
| 2016 | 113 | 124 |
| 2017 | 120 | 126 |
| 2018 | 124 | 114 |
| 2019 | 116 | 145 |
| 2020 | 154 | 139 |
| 2021 | 105 | 152 |
| 2022 | 129 | 153 |
| 2023 | 99 | 140 |
| 2024 | 102 | 139 |
| 2025 | 118 | 141 |
| 2026 | 82 | 91 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- System and method for fully integrated microcrystal electron diffraction (MicroED)6 Oct 2026US 12,755,925 B2The Regents of the University of California
- Sample holder and analysis system22 Sep 2026US 12,744,179 B2Hitachi High-Tech Corporation
- Method and system for analyzing three-dimensional features22 Sep 2026US 12,744,180 B2FEI Company
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Charged particle beam devices and membrane assemblies useful therein8 Oct 2026US 2026/0311957 A1Airsem Technologies Ltd.
- Method and apparatus for continuous chained energy ion implantation1 Oct 2026US 2026/0302126 A1Axcelis Technologies, Inc.
- Sample chamber heating assembly1 Oct 2026US 2026/0302127 A1
- Blended energy implant17 Sep 2026US 2026/0279718 A1Axcelis Technologies, Inc.
- Method to correct wafer placement for channel implant17 Sep 2026US 2026/0282839 A1
Most cited
By later US patents
- Substrate clamping technique in IC fabrication processes451US 4,184,188 AVeeco Instruments Inc. · 1980
- Method and apparatus for controlling sample temperature378US 4,565,601 AHitachi, Ltd. · 1986
- Substrate processing apparatus346US 8,741,065 B2Tokyo Electron Limited · 2014
- Manipulator for microscopy sample preparation and methods for making and use thereof170US 7,041,985 B1Western Digital (Fremont), LLC · 2006
- High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support168US 5,948,704 ALam Research Corporation · 1999