H01J 37/248
Components associated with high voltage supply
H01J37/248 (Components associated with high voltage supply) appears on 95 US grants and 85 published applications in this corpus.
Search patents in H01J- Granted patents
- 95
- Published applications
- 85
- Assignees
- 58
- Inventors
- 261
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 3 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 3 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 1 | 1 |
| 2008 | 2 | 5 |
| 2009 | 2 | 1 |
| 2010 | 3 | 3 |
| 2011 | 0 | 0 |
| 2012 | 1 | 2 |
| 2013 | 3 | 3 |
| 2014 | 2 | 5 |
| 2015 | 7 | 6 |
| 2016 | 4 | 3 |
| 2017 | 5 | 6 |
| 2018 | 6 | 5 |
| 2019 | 5 | 3 |
| 2020 | 5 | 11 |
| 2021 | 7 | 6 |
| 2022 | 5 | 2 |
| 2023 | 3 | 6 |
| 2024 | 3 | 6 |
| 2025 | 2 | 5 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam apparatus15 Sep 2026US 12,738,451 B2Hitachi High-Tech Corporation
- Creating ion energy distribution functions (IEDF)5 May 2026US 12,620,546 B2APPLIED Materials.Inc.
- DC high-voltage source device including plurality of variable DC voltage sources and plurality of switching circuits, and charged particle beam device including the DC high-voltage source device13 Jan 2026US 12,525,883 B2Hitachi High-Tech Corporation
- Integrated feedthrough for high voltage cables29 Jul 2025US 12,374,523 B1Hefei Comprehensive National Science Center Energy Research Institute (Anhui Energy Laboratory)
- High voltage amplifier circuit and analyzer apparatus21 Jan 2025US 12,206,333 B2JEOL Ltd.
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
- Systems for and methods of improved plasma enhanced deposition, surface modification, and abatement30 Apr 2026US 2026/0120993 A1Stellar Engiine, Inc.
- Insulation gas for high voltage component of electron microscopes9 Apr 2026US 2026/0100326 A1
- Linear accelerator having robust power feedthrough12 Mar 2026US 2026/0075697 A1APPLIED Materials.Inc.
- Gas cluster ion beam apparatus25 Dec 2025US 2025/0391627 A1IIPT Inc.
Most cited
By later US patents
- RF impedance matching network57US 9,196,459 B2Reno Technologies, Inc. · 2015
- Creating ion energy distribution functions (IEDF)49US 10,312,048 B2APPLIED Materials.Inc. · 2019
- Plasma delivery system for modulated plasma systems49US 10,720,305 B2Advanced Energy Industries, Inc. · 2020
- Creating ion energy distribution functions (IEDF)40US 10,685,807 B2APPLIED Materials.Inc. · 2020
- Particle beam accelerator37US 4,383,180 AVarian Associates, Inc. · 1983