Systems for and methods of improved plasma enhanced deposition, surface modification, and abatement

Abstract

A plasma-generating system produces highly reactive species and radicals for chemical processing. The system includes an array of plasma-producing applicators for generating a plasma within a processing cavity when excited by high voltages, a power source comprising one or more high voltage power supplies for generating high voltages, the one or more high voltage power supplies coupled to the array of plasma-producing applicators; a gas or vaporizer supply coupled to one side of the array of applicators; and an electronic controller for instructing the power source and the gas or vaporizer supply to turn on at selected times and at set operating levels to generate the plasma within the processing cavity, the electronic controller further for controlling relative motion, distance, orientation, or any combination thereof between the substrate and the array of plasma producing applicators.

Dependencies are inferred from the claim text.