H01J 37/252
Tubes for spot-analysing by electron or ion beams
Official title: Tubes for spot-analysing by electron or ion beams; Microanalysers
H01J37/252 (Tubes for spot-analysing by electron or ion beams) appears on 340 US grants and 216 published applications in this corpus.
Search patents in H01J- Granted patents
- 340
- Published applications
- 216
- Assignees
- 162
- Inventors
- 666
- Latest grant
- 8 Apr 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 4 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 6 | 0 |
| 1985 | 7 | 0 |
| 1986 | 2 | 0 |
| 1987 | 6 | 0 |
| 1988 | 6 | 0 |
| 1989 | 8 | 0 |
| 1990 | 4 | 0 |
| 1991 | 10 | 0 |
| 1992 | 8 | 0 |
| 1993 | 8 | 0 |
| 1994 | 6 | 0 |
| 1995 | 5 | 0 |
| 1996 | 4 | 0 |
| 1997 | 8 | 0 |
| 1998 | 4 | 0 |
| 1999 | 5 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 3 |
| 2002 | 6 | 7 |
| 2003 | 11 | 11 |
| 2004 | 15 | 10 |
| 2005 | 11 | 7 |
| 2006 | 8 | 12 |
| 2007 | 8 | 27 |
| 2008 | 12 | 14 |
| 2009 | 21 | 6 |
| 2010 | 7 | 10 |
| 2011 | 10 | 16 |
| 2012 | 14 | 8 |
| 2013 | 14 | 8 |
| 2014 | 7 | 14 |
| 2015 | 10 | 10 |
| 2016 | 7 | 6 |
| 2017 | 12 | 5 |
| 2018 | 3 | 6 |
| 2019 | 3 | 3 |
| 2020 | 7 | 10 |
| 2021 | 6 | 9 |
| 2022 | 8 | 5 |
| 2023 | 9 | 1 |
| 2024 | 2 | 2 |
| 2025 | 1 | 3 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- System to inspect, modify or analyze a region of interest of a sample by charged particles, set of systems to inspect, modify or analyze a region of interest of a sample and method to inspect, modify or analyze a region of interest of a sample by charged particles8 Apr 2025US 12,270,774 B2Carl Zeiss SMT GmbH
- Real-time direct measurement of mechanical properties in-situ of scanning beam microscope2 Jul 2024US 12,027,343 B2University of Connecticut
- Method of examining a sample using a charged particle microscope30 Apr 2024US 11,971,372 B2FEI Company
- Variable reduction ratio spherical aberration correction electrostatic lens, wide angle energy analyzer, and two-dimensional electron spectrometer17 Oct 2023US 11,791,148 B2University Corporation National Nara Institute of Science and Technology
- Charged particle beam device and analysis method25 Jul 2023US 11,710,615 B2JEOL Ltd.
- Analyzer and Analysis Method27 Aug 2026US 2026/0251596 A1JEOL Ltd.
- Charged particle beam device and inspection method using same2 Jul 2026US 2026/0188605 A1Hitachi High-Tech Corporation
- Apparatus and method for improved electron beam inspection with a charge treatment electron source30 Apr 2026US 2026/0120989 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for creating detection data in electron beam application device, method for synthesizing image of object being irradiated, program, recording medium, and electron beam application device24 Apr 2025US 2025/0132117 A1Photo electron Soul Inc.
- Real-time direct measurement of mechanical properties in-situ of scanning beam microscope24 Apr 2025US 2025/0132125 A1University of Connecticut
Most cited
By later US patents
- Semiconductor device tester which measures information related to a structure of a sample in a depth direction96US 6,768,324 B1Fab Solutions, Inc. · 2004
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process81US 5,233,191 AHitachi, Ltd. · 1993
- Surface analysis method and apparatus for carrying out the same72US 5,481,109 AHitachi, Ltd. · 1996
- Ion sources, systems and methods67US 7,554,097 B2ALIS Corporation · 2009