H01J 37/256
Using scanning beams
Official title: using scanning beams
H01J37/256 (Using scanning beams) appears on 190 US grants and 129 published applications in this corpus.
Search patents in H01J- Granted patents
- 190
- Published applications
- 129
- Assignees
- 103
- Inventors
- 389
- Latest grant
- 8 Apr 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 7 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 1 |
| 2002 | 4 | 5 |
| 2003 | 8 | 9 |
| 2004 | 11 | 9 |
| 2005 | 10 | 6 |
| 2006 | 4 | 10 |
| 2007 | 7 | 9 |
| 2008 | 9 | 10 |
| 2009 | 5 | 6 |
| 2010 | 4 | 5 |
| 2011 | 7 | 13 |
| 2012 | 10 | 7 |
| 2013 | 12 | 3 |
| 2014 | 4 | 7 |
| 2015 | 3 | 2 |
| 2016 | 4 | 1 |
| 2017 | 2 | 2 |
| 2018 | 3 | 3 |
| 2019 | 3 | 2 |
| 2020 | 2 | 5 |
| 2021 | 3 | 4 |
| 2022 | 5 | 5 |
| 2023 | 6 | 1 |
| 2024 | 2 | 1 |
| 2025 | 1 | 1 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- System to inspect, modify or analyze a region of interest of a sample by charged particles, set of systems to inspect, modify or analyze a region of interest of a sample and method to inspect, modify or analyze a region of interest of a sample by charged particles8 Apr 2025US 12,270,774 B2Carl Zeiss SMT GmbH
- Real-time direct measurement of mechanical properties in-situ of scanning beam microscope2 Jul 2024US 12,027,343 B2University of Connecticut
- Method of examining a sample using a charged particle microscope30 Apr 2024US 11,971,372 B2FEI Company
- Charged particle beam device and analysis method25 Jul 2023US 11,710,615 B2JEOL Ltd.
- Charged particle beam apparatus and setting assisting method20 Jun 2023US 11,682,539 B2JEOL Ltd.
- Charged particle beam device and inspection method using same2 Jul 2026US 2026/0188605 A1Hitachi High-Tech Corporation
- Apparatus and method for improved electron beam inspection with a charge treatment electron source30 Apr 2026US 2026/0120989 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Real-time direct measurement of mechanical properties in-situ of scanning beam microscope24 Apr 2025US 2025/0132125 A1University of Connecticut
- System to inspect, modify or analyze a region of interest of a sample by charged particles, set of systems to inspect, modify or analyze a region of interest of a sample and method to inspect, modify or analyze a region of interest of a sample by charged particles29 Aug 2024US 2024/0288391 A1Carl Zeiss SMT GmbH
- Real-time direct measurement of mechanical properties in-situ of scanning beam microscope6 Apr 2023US 2023/0106426 A1University of Connecticut
Most cited
By later US patents
- Semiconductor device tester which measures information related to a structure of a sample in a depth direction96US 6,768,324 B1Fab Solutions, Inc. · 2004
- Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process81US 5,233,191 AHitachi, Ltd. · 1993
- Method and apparatus for enhancing yield of secondary ions65US 6,414,307 B1FEI Company · 2002
- Method and apparatus for processing a micro sample63US 6,781,125 B2Hitachi, Ltd. · 2004
- Apparatus utilizing charged-particle beam57US 4,894,541 AJEOL Ltd. · 1990