Charged particle beam device and analysis method
AssigneeJEOL Ltd.
InventorsKenichi Tsutsumi, Tatsuya Uchida
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AssigneeJEOL Ltd.
InventorsKenichi Tsutsumi, Tatsuya Uchida
Estimating the term…
A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.
A charged particle beam device comprising:
An analysis method for use in a charged particle beam device including a charged particle beam source and an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source, the analysis method comprising:
Dependencies are inferred from the claim text.