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AssigneeHitachi, Ltd.
InventorsKen Ninomiya, Hideo Todokoro, Tokuo Kure, Yasuhiro Mitsui, Katsuhiro Kuroda, Hiroyasu Shichi
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A surface analysis method and an apparatus for carrying out the samein which the method involves the detection of fluorescence X-rays emitted from the surface of a sample in response to a finely focused electron beam irradiated thereto, whereby residues on the sample surface are analyzed qualitatively and quantitatively. An electron beam (1) is irradiated through a hole (9) at the center of an X-ray detector (8) into a fine hole (h) on the surface of a sample (2). In response, fluorescence X-rays are emitted from inside the fine hole (h) and are detected by an annular X-ray detector (8) having an energy analysis function near the axis of the electron beam (1) (preferably within 20 degrees with respect to the center axis of the electron beam). This arrangement allows the fluorescence X-rays from the fine hole (h) to reach the X-ray detector (8) without being absorbed by the substance of the material. That in turn ensures qualitative and quantitative analysis of high accuracy about residues in fine holes of large aspect ratios. Since the method is of non-destructive nature, the analyzed sample may be placed unscathed back into the fabrication process.
A surface analysis method for analyzing residues inside small holes on the surface of a sample by irradiating an accelerated and focused electron beam into said small holes and by observing fluorescence X-rays emitted therefrom in return, said surface analysis method comprising the step of observing said fluorescence X-rays within an angle .alpha. with respect to the center axis of the electron beam, said angle being defined as
A surface analysis method for analyzing residues on the surface of a sample by irradiating an accelerated and focused electron beam onto the sample surface and by observing fluorescence X-rays emitted therefrom in return, said surface analysis method comprising the step of observing said fluorescence X-rays within an angle of 20 degrees with respect to the center axis of the electron beam.
A surface analysis apparatus comprising electron beam irradiating means for irradiating a finely focused electron beam into small holes on the surface of a sample, and fluorescence X-ray observing means for observing fluorescence X-rays emitted from said small holes in response to the irradiation of the electron beam, wherein said fluorescence X-ray observing means includes a function for spectrally detecting said fluorescence X-rays emitted within an angle .alpha. with respect to the center axis of said electron beam, said angle being defined as
A surface analysis apparatus comprising electron beam irradiating means for irradiating a finely focused electron beam onto the surface of a sample, and fluorescence X-ray observing means for observing fluorescence X-rays emitted from the sample surface in response to the irradiation of the electron beam, wherein said fluorescence X-ray observing means includes a function for spectrally detecting said fluorescence X-rays emitted within an angle of 20 degrees with respect to the center axis of said electron beam.
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