Arc-beam position monitoring and position control in PICVD coating systems

A method for stabilizing a position and a shape of a plasma beam established between a cathode and an anode, the method comprising the steps of:

• establishing an electrical field between the cathode and the anode, wherein a shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided, wherein the at least one oriented electromagnetic coil has a coil axis oriented in a non-colinear manner to the reference line in such a way that at least one straight line which intersects a coil opening of the at least one oriented electromagnetic coil and which is parallel to the coil axis intersects with the reference line;
• sending a current through the at least one oriented electromagnetic coil;
• producing by a set of coils magnetic fields Bx, By configured to deflect or attract the plasma beam,
• wherein the magnetic fields Bx, By are oriented perpendicular to an axial magnetic field Bz thereby stabilizing the plasma beam;
• and
• using the magnetic fields Bx By and a determination of an arc impedance to determine a plasma beam position.