Filtered cathodic arc deposition method and apparatus

An apparatus for the application of coating in a vacuum, comprising:

• at least one plasma source comprising a cathode contained within a cathode chamber,
• at least one proximal anode associated with the cathode for generating an arc discharge,
• a plasma duct in communication with the cathode chamber and with a coating chamber containing a substrate holder for mounting substrates to be coated, the substrate holder being positioned off of an optical axis of the cathode, and
• a plurality of auxiliary anodes disposed downstream of the plasma source for generating an auxiliary arc discharge,
• wherein the plurality of auxiliary anodes are disposed within the coating chamber adjacent to walls of the coating chamber and one or more of the plurality of auxiliary anodes is associated with a magnetic deflecting coil adjacent to the anode and at least one of the plurality of auxiliary anodes is disposed tangentially to the magnetic force lines generated by the deflecting magnetic coil.

An apparatus for the application of coating in a vacuum, comprising:

• at least one plasma source comprising a cathode contained within a cathode chamber,
• at least one proximal anode associated with the cathode for generating an arc discharge,
• a plasma duct in communication with the cathode chamber and with a coating chamber containing a substrate holder for mounting substrates to be coated, the substrate holder being positioned off of an optical axis of the cathode, and
• a plurality of auxiliary anodes disposed downstream of the plasma source for generating an auxiliary arc discharge,
• wherein the plurality of auxiliary anodes are disposed within the coating chamber adjacent to walls of the coating chamber and one or more of the plurality of auxiliary anodes is associated with a magnetic deflecting coil adjacent to the anode and at least one of the plurality of auxiliary anodes is disposed transversely to the magnetic force lines generated by the deflecting magnetic coil.

An apparatus for the application of coating in a vacuum, comprising:

• at least one plasma source comprising a cathode contained within a cathode chamber,
• at least one proximal anode associated with the cathode for generating an arc discharge,
• a plasma duct in communication with the cathode chamber and with a coating chamber containing a substrate holder for mounting substrates to be coated, the substrate holder being positioned off of an optical axis of the cathode, and
• at least one auxiliary anode disposed downstream of the plasma source for generating an auxiliary arc discharge,
• wherein the auxiliary anode is disposed within the coating chamber adjacent to the substrate holder opposite the plasma duct and at least one magnetron arc source is disposed within the coating chamber.

An apparatus for the application of coating in a plasma-immersed environment, comprising:

• a first plasma source comprising a first cathode contained within a cathode chamber and associated with an anode for generating an arc discharge between the anode and the first cathode,
• a plasma duct in communication with the cathode chanter and with a coating chamber containing a substrate holder for mounting substrates to be coated, the substrate holder being positioned off of an optical axis of the first cathode,
• a second plasma source comprising a second cathode in communication with the coating chamber and associated with an anode for generating an arc discharge between the anode and the second cathode, and
• a deflecting system for directing a flow of plasma to the coating chamber,
• wherein the defecting system can be deactivated while the first arc source is activated so that plasma from the first cathode does not flow into the coating chamber but electrons emitted from the first cathode flow into the coating chamber.

An apparatus for the application of coatings in a vacuum, comprising:

• a pair of cathode chambers,
• at least one filtered arc source comprising at least one cathode contained within each cathode chamber,
• at least one anode associated with each cathode for generating an arc discharge,
• a main plasma duct in communication with a coating chamber containing a substrate holder for mounting substrates to be coated, the main plasma duct containing at least one main deflecting electrode,
• a filtered plasma duct in communication with each cathode chamber and in communication with the main plasma duct, the main plasma duct being positioned off of an optical axis of each cathode chamber and each filtered plasma duct being positioned off of an optical axis of the coating chamber,
• the filtered plasma ducts each containing at least one second deflecting electrode electrically insulated form the filtered plasma duct and disposed adjacent to one or more walls of the filtered plasma duct that are not occupied by the cathode, and
• at least one deflecting conductor disposed adjacent to each plasma source and filtered plasma duct,
• wherein plasma generated by each plasma source is deflected by each filtered deflecting electrode through each filtered plasma duct and then deflected by the main deflecting electrode through the main plasma duct to the coating chamber.