Device and method for plasma atmosphere control
AssigneeL'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des Procedes Georges Claude
InventorWentan WU
Life of this patent
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Abstract
A device and method for atmosphere control using plasma, configured for removing residuals within an at least partially enclosed chamber. A reactive gas is formed from a gas mixture, wherein the reactive gas includes an inert gas and/or a reducing gas. The reactive gas is delivered to a plasma generation system, and the generated plasma is introduced into the at least partially enclosed chamber. The plasma diffuses and reacts with the residues in the chamber until the residue concentration is reduced to below a predetermined value. The technical solution of the present application is particularly suitable for applications where the atmosphere needs to be quickly switched and rapidly reduced to extremely low oxygen levels.
Claims10
A method for atmosphere control using plasma to remove residues within an at least partially enclosed chamber, comprising:
- forming a reactive gas from a gas mixture, wherein the reactive gas includes an inert gas and/or a reducing gas;
- and
- delivering the reactive gas to a plasma generation system, wherein the generated plasma is introduced into the at least partially enclosed chamber;
- wherein the plasma diffuses and reacts with the residues in the chamber until the residue concentration reduces to below a predetermined value.
A device for performing atmosphere control using plasma, comprising:
- an at least partially enclosed chamber, the chamber comprising a top, a side wall, and a bottom wall, collectively defining the internal volume of the chamber;
- and
- a plasma generation system configured to generate plasma and configured to introduce the plasma into the at least partially enclosed chamber, wherein the plasma diffuses and reacts with residues in the chamber until the residue concentration is reduced to a predetermined value.
Dependencies are inferred from the claim text.