H01J 37/32403
Treating multiple sides of workpieces
Official title: {Treating multiple sides of workpieces, e.g. 3D workpieces}
H01J37/32403 (Treating multiple sides of workpieces) appears on 79 US grants and 124 published applications in this corpus.
Search patents in H01J- Granted patents
- 79
- Published applications
- 124
- Assignees
- 87
- Inventors
- 335
- Latest grant
- 27 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2009 | 0 | 2 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 2 | 2 |
| 2013 | 0 | 2 |
| 2014 | 2 | 11 |
| 2015 | 3 | 8 |
| 2016 | 5 | 11 |
| 2017 | 3 | 15 |
| 2018 | 13 | 17 |
| 2019 | 10 | 8 |
| 2020 | 6 | 12 |
| 2021 | 8 | 10 |
| 2022 | 8 | 3 |
| 2023 | 7 | 9 |
| 2024 | 5 | 8 |
| 2025 | 6 | 4 |
| 2026 | 1 | 1 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Plasma generating device, plasma processing device, and plasma etching device for seamless roller mold27 Jan 2026US 12,538,409 B2Asahi Kasei Kabushiki Kaisha
- Deposition apparatus and deposition method30 Dec 2025US 12,509,761 B2Carux Technology Pte. Ltd.
- Low temperature selective etching of silicon nitride using microwave plasma7 Oct 2025US 12,438,005 B2APPLIED Materials.Inc.
- Method of ion-plasma application of corrosion-resistant film coatings on articles made from zirconium alloys10 Jun 2025US 12,325,907 B2Joint-Stock Company “Tvel”
- Sputtering apparatus for coating of 3D-objects8 Apr 2025US 12,272,525 B2Evatec AG
- Method of etching a substrate26 Mar 2026US 2026/0086275 A1
- Apparatus and Method for Plasma Enhanced Chemical Vapour Deposition23 Oct 2025US 2025/0327184 A1LeydenJar Technologies B.V.
- Installation, method, and carrier for coating eyeglass lenses12 Jun 2025US 2025/0191900 A1Schneider GmbH & Co. KG
- Apparatus and Method for Plasma Enhanced Chemical Vapour Deposition5 Jun 2025US 2025/0179643 A1LeydenJar Technologies B.V.
- Chamber for substrate backside and bevel deposition30 Jan 2025US 2025/0037974 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Back side deposition apparatus and applications378US 9,881,788 B2Lam Research Corporation · 2018
- Biasable flux optimizer / collimator for PVD sputter chamber12US 9,960,024 B2APPLIED Materials.Inc. · 2018
- Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications10US 9,515,166 B2APPLIED Materials.Inc. · 2016
- Method and apparatus for selective deposition9US 9,385,219 B2APPLIED Materials.Inc. · 2016
- Techniques for manipulating patterned features using ions8US 9,984,889 B2Varian Semiconductor Equipment Associates, Inc. · 2018