Biasable flux optimizer / collimator for PVD sputter chamber

A substrate-processing chamber, comprising:

• a chamber body defining an inner volume;
• a sputtering target disposed in an upper portion of the inner volume;
• a substrate support disposed below the sputtering target;
• a collimator assembly for encircling the sputtering target, comprising:
• a collimator, comprising:
• a honeycomb structure having walls defining and separating hexagonal apertures, wherein the hexagonal apertures include:
• a first plurality of hexagonal apertures in a central region having a first aspect ratio;
• a second plurality of hexagonal apertures in a peripheral region having a second aspect ratio less than the first aspect ratio;
• and
• a third plurality of hexagonal apertures in a transitional region disposed between the central region and the peripheral region,
• wherein walls defining the third plurality of apertures of the transitional region are cut along an angle to form a conical shape surrounding the central region,
• wherein the conical shape is defined by a circular edge formed by the walls of the transitional region, and
• wherein an upper portion of the walls include an entrance angle portion;
• and
• a shield portion coupled with the collimator, comprising:
• a top ring;
• a support ledge below the top ring, the support ledge extending radially outward;
• and
• a cylindrical band extending downward from the support ledge to an elevation below the honeycomb structure.