H01J 37/32412
Plasma immersion ion implantation
Official title: {Plasma immersion ion implantation}
H01J37/32412 (Plasma immersion ion implantation) appears on 327 US grants and 409 published applications in this corpus.
Search patents in H01J- Granted patents
- 327
- Published applications
- 409
- Assignees
- 93
- Inventors
- 621
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 9 | 0 |
| 2001 | 14 | 4 |
| 2002 | 7 | 9 |
| 2003 | 8 | 11 |
| 2004 | 3 | 11 |
| 2005 | 2 | 13 |
| 2006 | 3 | 22 |
| 2007 | 6 | 21 |
| 2008 | 12 | 35 |
| 2009 | 15 | 32 |
| 2010 | 17 | 21 |
| 2011 | 17 | 24 |
| 2012 | 17 | 30 |
| 2013 | 14 | 21 |
| 2014 | 21 | 25 |
| 2015 | 19 | 20 |
| 2016 | 23 | 17 |
| 2017 | 17 | 11 |
| 2018 | 7 | 16 |
| 2019 | 15 | 10 |
| 2020 | 10 | 13 |
| 2021 | 11 | 10 |
| 2022 | 9 | 10 |
| 2023 | 8 | 8 |
| 2024 | 7 | 9 |
| 2025 | 7 | 4 |
| 2026 | 5 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Control of plasma sheath with bias supplies4 Aug 2026US 12,700,569 B2Advanced Energy Industries, Inc.
- Target processing device and target processing method7 Jul 2026US 12,676,292 B2Kioxia Corporation
- Vaporizer and ion source12 May 2026US 12,626,888 B2Nissin Ion Equipment Co., Ltd.
- Creating ion energy distribution functions (IEDF)5 May 2026US 12,620,546 B2APPLIED Materials.Inc.
- Filament alignment device21 Apr 2026US 12,609,281 B2Samsung Electronics Co., Ltd.
- Shielded gas inlet for an ion source19 Feb 2026US 2026/0051459 A1Axcelis Technologies, Inc.
- Gas supply apparatus and substrate processing apparatus22 Jan 2026US 2026/0024725 A1Nissin Ion Equipment Co., Ltd.
- Ion extraction optics with dynamic extraction angle control25 Dec 2025US 2025/0391633 A1APPLIED Materials.Inc.
- Vaporizer and ion source28 Aug 2025US 2025/0273437 A1Nissin Ion Equipment Co., Ltd.
- Control of plasma sheath with bias supplies22 May 2025US 2025/0166970 A1Advanced Energy Industries, Inc.
Most cited
By later US patents
- Low temperature CVD process with selected stress of the CVD layer on CMOS devices559US 7,393,765 B2APPLIED Materials.Inc. · 2008
- Clustertool system software using plasma immersion ion implantation336US 6,321,134 B1Silicon Genesis Corporation · 2001
- System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate232US 6,237,527 B1Axcelis Technologies, Inc. · 2001
- Method and apparatus for plasma source ion implantation218US 4,764,394 AWisconsin Alumni Research Foundation · 1988
- Method for implanting negative hydrogen ion and implanting apparatus190US 6,335,535 B12002