H01J 37/32321
Discharge generated by other radiation
Official title: {Discharge generated by other radiation (H01J37/32055, H01J37/32073, H01J37/32082, H01J37/32192, H01J37/32348 take precedence)}
H01J37/32321 (Discharge generated by other radiation) appears on 256 US grants and 269 published applications in this corpus.
Search patents in H01J- Granted patents
- 256
- Published applications
- 269
- Assignees
- 166
- Inventors
- 654
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 4 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 4 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 2 | 0 |
| 1999 | 4 | 0 |
| 2000 | 6 | 0 |
| 2001 | 6 | 7 |
| 2002 | 11 | 9 |
| 2003 | 12 | 8 |
| 2004 | 12 | 9 |
| 2005 | 5 | 8 |
| 2006 | 5 | 9 |
| 2007 | 7 | 13 |
| 2008 | 5 | 14 |
| 2009 | 7 | 9 |
| 2010 | 4 | 8 |
| 2011 | 5 | 6 |
| 2012 | 0 | 2 |
| 2013 | 4 | 13 |
| 2014 | 6 | 11 |
| 2015 | 6 | 15 |
| 2016 | 8 | 13 |
| 2017 | 19 | 27 |
| 2018 | 15 | 11 |
| 2019 | 16 | 22 |
| 2020 | 7 | 12 |
| 2021 | 10 | 6 |
| 2022 | 8 | 11 |
| 2023 | 10 | 12 |
| 2024 | 8 | 7 |
| 2025 | 8 | 5 |
| 2026 | 6 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Methods of forming structures, semiconductor processing systems, and semiconductor device structures22 Sep 2026US 12,742,242 B2ASM IP Holding B. V.
- Virtual shutter in ion beam system30 Jun 2026US 12,671,062 B2Plasma-Therm NES LLC
- Electrode filament connection member, chemical vapor deposition apparatus, and method for manufacturing recording medium substrate21 Apr 2026US 12,606,914 B2Resonac Hard Disk Corporation
- Plasma processing method and plasma processing device24 Feb 2026US 12,562,343 B2Tokyo Electron Limited
- System and method for semiconductor structure3 Feb 2026US 12,543,517 B2Tokyo Electron Limited
- System and method for semiconductor structure30 Apr 2026US 2026/0123297 A1Tokyo Electron Limited
- Plasma treatment device15 Jan 2026US 2026/0018388 A1Clean Crop Technologies, Inc.
- Electron gun, electron beam application device, and method for forming multi-electron beam6 Nov 2025US 2025/0343024 A1Photo electron Soul Inc.
- Electron beam device for surface treatment16 Oct 2025US 2025/0323006 A1
- Electrode filament connection member, chemical vapor deposition apparatus, and method for manufacturing recording medium substrate29 May 2025US 2025/0171903 A1Resonac Hard Disk Corporation
Most cited
By later US patents
- Method of operating a dual chamber reactor with neutral density decoupled from ion density606US 6,635,578 B1APPLIED Materials.Inc. · 2003
- Photoelectric enhanced plasma glow discharge system and method including radiation means514US 4,664,769 AInternational Business Machines Corporation · 1987
- Photo-excited gas processing apparatus for semiconductor process513US 6,506,253 B2Tokyo Electron Limited · 2003
- Photo-assisted remote plasma apparatus and method475US 6,576,564 B2Micron Technology, Inc. · 2003
- Photo-assisted method for semiconductor fabrication474US 6,930,041 B2Micron Technology, Inc. · 2005