H01J 37/32339
Using electromagnetic radiation
Official title: {using electromagnetic radiation}
H01J37/32339 (Using electromagnetic radiation) appears on 107 US grants and 105 published applications in this corpus.
Search patents in H01J- Granted patents
- 107
- Published applications
- 105
- Assignees
- 71
- Inventors
- 270
- Latest grant
- 24 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 3 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 1 |
| 2002 | 5 | 3 |
| 2003 | 6 | 3 |
| 2004 | 4 | 3 |
| 2005 | 1 | 2 |
| 2006 | 3 | 4 |
| 2007 | 2 | 4 |
| 2008 | 2 | 1 |
| 2009 | 1 | 2 |
| 2010 | 1 | 4 |
| 2011 | 2 | 2 |
| 2012 | 0 | 0 |
| 2013 | 0 | 2 |
| 2014 | 3 | 4 |
| 2015 | 1 | 8 |
| 2016 | 3 | 7 |
| 2017 | 10 | 13 |
| 2018 | 7 | 2 |
| 2019 | 6 | 12 |
| 2020 | 1 | 4 |
| 2021 | 6 | 5 |
| 2022 | 4 | 5 |
| 2023 | 6 | 5 |
| 2024 | 4 | 6 |
| 2025 | 5 | 2 |
| 2026 | 3 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma processing method and plasma processing device24 Feb 2026US 12,562,343 B2Tokyo Electron Limited
- System and method for semiconductor structure3 Feb 2026US 12,543,517 B2Tokyo Electron Limited
- Laser-sustained plasma generation in supersonic gas jets27 Jan 2026US 12,538,408 B2KLA Corporation
- Plasma processing apparatus and plasma processing method2 Dec 2025US 12,488,964 B2Tohoku University
- Substrate processing apparatus and method for processing substrates9 Sep 2025US 12,410,522 B2ASM IP Holding B. V.
- System and method for semiconductor structure30 Apr 2026US 2026/0123297 A1Tokyo Electron Limited
- Method of patterning a target layer, apparatus for patterning a target layer6 Feb 2025US 2025/0046577 A1ASML Netherlands B. V.
- Laser-sustained plasma generation in supersonic gas jets9 Jan 2025US 2025/0016905 A1KLA Corporation
- System and Method for Semiconductor Structure14 Nov 2024US 2024/0379354 A1Tokyo Electron Limited
- Apparatus and methods for nanoplasma switches3 Oct 2024US 2024/0334584 A1Analog Devices International Unlimited Company
Most cited
By later US patents
- Photo-excited gas processing apparatus for semiconductor process513US 6,506,253 B2Tokyo Electron Limited · 2003
- Photo-assisted remote plasma apparatus and method475US 6,576,564 B2Micron Technology, Inc. · 2003
- Photo-assisted method for semiconductor fabrication474US 6,930,041 B2Micron Technology, Inc. · 2005
- Photo-assisted method for semiconductor fabrication471US 7,238,616 B2Micron Technology, Inc. · 2007
- Microwave enhanced CVD system under magnetic field373US 5,512,102 ASemiconductor Energy Laboratory Co.Ltd. · 1996