Substrate processing apparatus and method for processing substrates
AssigneeASM IP Holding B.V.
InventorsDieter Pierreux, Werner Knaepen, Bert Jongbloed, Jeroen Fluit
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Abstract
The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.
Claims20
A reaction chamber comprising:
- a rack configured to hold a plurality of substrates, wherein the plurality of substrates are aligned vertically in the rack;
- an illumination system configured to produce ultraviolet radiation within a range from 100 to 500 nanometers, wherein the illumination system is constructed and arranged to irradiate ultraviolet radiation onto a top surface of each of the plurality of substrates in the rack in the reaction chamber, wherein the illumination system is configured such that the average direction of the ultraviolet radiation is at an angle in the range of 80 to 89.5 degrees with respect to a line perpendicular to the top surfaces of the plurality of substrates;
- and
- a power controller configured to control the power of the illumination system, wherein the power controller is programmed to adjust a radiation output of the illumination system along a width of the rack.
Dependencies are inferred from the claim text.