H01J 37/3233
Using charged particles
Official title: {using charged particles}
H01J37/3233 (Using charged particles) appears on 113 US grants and 123 published applications in this corpus.
Search patents in H01J- Granted patents
- 113
- Published applications
- 123
- Assignees
- 80
- Inventors
- 309
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 3 |
| 2002 | 6 | 3 |
| 2003 | 3 | 3 |
| 2004 | 4 | 1 |
| 2005 | 3 | 4 |
| 2006 | 1 | 4 |
| 2007 | 1 | 6 |
| 2008 | 3 | 12 |
| 2009 | 5 | 6 |
| 2010 | 2 | 1 |
| 2011 | 3 | 3 |
| 2012 | 0 | 1 |
| 2013 | 2 | 9 |
| 2014 | 2 | 7 |
| 2015 | 5 | 5 |
| 2016 | 3 | 5 |
| 2017 | 9 | 14 |
| 2018 | 7 | 8 |
| 2019 | 9 | 9 |
| 2020 | 5 | 6 |
| 2021 | 4 | 1 |
| 2022 | 3 | 4 |
| 2023 | 2 | 5 |
| 2024 | 3 | 0 |
| 2025 | 3 | 2 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Virtual shutter in ion beam system30 Jun 2026US 12,671,062 B2Plasma-Therm NES LLC
- Method and system for controlling the state of stress in deposited thin films13 May 2025US 12,297,529 B1Corporation for National Research Initiatives
- Plasma treatment device1 Apr 2025US 12,266,510 B2Clean Crop Technologies, Inc.
- Charged particle emission device, system, method, and program18 Feb 2025US 12,230,478 B2National University Corporation, Iwate University
- Charged particle emission device, system, method, and program26 Nov 2024US 12,154,762 B2National University Corporation, Iwate University
- Plasma treatment device15 Jan 2026US 2026/0018388 A1Clean Crop Technologies, Inc.
- Electron gun, electron beam application device, and method for forming multi-electron beam6 Nov 2025US 2025/0343024 A1Photo electron Soul Inc.
- Electron beam device for surface treatment16 Oct 2025US 2025/0323006 A1
- Electron source, plasma source and switch device23 Nov 2023US 2023/0377828 A1Kabushiki Kaisha Toshiba
- Virtual shutter in ion beam system26 Oct 2023US 2023/0343557 A1Plasma-Therm NES LLC
Most cited
By later US patents
- Sterilization by low energy electron beam90US 6,140,657 AAmerican International Technologies, Inc. · 2000
- Electron beam excited plasma system60US 5,397,956 ATokyo Electron Limited · 1995
- Method and system for controlling the uniformity of a ballistic electron beam by RF modulation57US 8,083,961 B2Texas Instruments Incorporated · 2011
- Large area plasma processing system (LAPPS)47US 5,874,807 AThe United States of America as represented by the Secretary of the Navy · 1999
- Plasma CVD method for producing a diamond coating44US 5,616,373 ABalzers Aktiengesellschaft · 1997