H01J 37/32192
Microwave generated discharge
Official title: {Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence)}
H01J37/32192 (Microwave generated discharge) appears on 1,653 US grants and 1,797 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,653
- Published applications
- 1,797
- Assignees
- 509
- Inventors
- 3,202
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 4 | 0 |
| 1985 | 8 | 0 |
| 1986 | 8 | 0 |
| 1987 | 4 | 0 |
| 1988 | 9 | 0 |
| 1989 | 8 | 0 |
| 1990 | 15 | 0 |
| 1991 | 22 | 0 |
| 1992 | 25 | 0 |
| 1993 | 37 | 0 |
| 1994 | 43 | 0 |
| 1995 | 30 | 0 |
| 1996 | 36 | 0 |
| 1997 | 40 | 0 |
| 1998 | 26 | 0 |
| 1999 | 42 | 0 |
| 2000 | 45 | 0 |
| 2001 | 63 | 22 |
| 2002 | 46 | 58 |
| 2003 | 35 | 44 |
| 2004 | 45 | 71 |
| 2005 | 32 | 50 |
| 2006 | 22 | 60 |
| 2007 | 30 | 65 |
| 2008 | 20 | 48 |
| 2009 | 33 | 71 |
| 2010 | 37 | 72 |
| 2011 | 38 | 58 |
| 2012 | 40 | 55 |
| 2013 | 26 | 70 |
| 2014 | 50 | 77 |
| 2015 | 44 | 109 |
| 2016 | 71 | 80 |
| 2017 | 64 | 85 |
| 2018 | 58 | 76 |
| 2019 | 62 | 88 |
| 2020 | 83 | 76 |
| 2021 | 57 | 88 |
| 2022 | 55 | 70 |
| 2023 | 50 | 87 |
| 2024 | 76 | 77 |
| 2025 | 68 | 86 |
| 2026 | 44 | 54 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/32211Means for coupling power to the plasma793
- H01J 37/32266Means for controlling power transmitted to the plasma210
- H01J 37/32201Generating means124
- H01J 37/32311Circuits specially adapted for controlling the microwave discharge110
- H01J 37/32302Plural frequencies48
- H01J 37/32293Using particular waveforms46
Recent patents
- Plasma processing apparatus6 Oct 2026US 12,755,939 B2Tokyo Electron Limited
- Plasma processing apparatus6 Oct 2026US 12,755,940 B2Tokyo Electron Limited
- Modification method and modification device6 Oct 2026US 12,755,941 B2Tokyo Electron Limited
- Plasma processing apparatus and gas exhaust method6 Oct 2026US 12,755,945 B2Hitachi High-Tech Corporation
- Plasma showerhead assembly and method of reducing defects29 Sep 2026US 12,747,502 B2APPLIED Materials.Inc.
- Method and apparatus for producing metallic silicon1 Oct 2026US 2026/0297732 A1Honda Motor Co., Ltd.
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
- Cleaning method and plasma processing apparatus24 Sep 2026US 2026/0290765 A1Tokyo Electron Limited
- Plasma measurement method and plasma measurement system17 Sep 2026US 2026/0279747 A1Tokyo Electron Limited
- Microwave System for Microwave-Assisted Surface Chemistry Annealing of ALD Processes Utilizing Microwave Radiation Energy10 Sep 2026US 2026/0265912 A1MKS Inc.
Most cited
By later US patents
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992
- Method for improved remote microwave plasma source for use with substrate processing system621US 6,271,148 B1APPLIED Materials.Inc. · 2001
- Plasma treatment method and apparatus581US 5,242,539 AHitachi, Ltd. · 1993
- Plasma processing method and film forming method509US 7,771,796 B2Tokyo Electron Limited · 2010
- Plasma processing method and equipment used therefor500US 5,827,435 ANEC Corporation · 1998